Search Results - "TRUSSELL DAVID" :: K.UTB vyhledávací portál

Loading…

MULTI-PART ELECTRODE FOR A SEMICONDUCTOR PROCESSING PLASMA REACTOR AND METHOD OF REPLACING A PORTION OF A MULTI-PART ELECTRODE

by LOEWENHARDT PETER, KENNEDY WILLIAM S, TRUSSELL DAVID, FISCHER ANDREAS
Year of Publication 24.03.2011

Get full text

Patent

Loading…

Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode

by Fischer, Andreas, Kennedy, William S, Loewenhardt, Peter, Trussell, David
Year of Publication 04.01.2011

Get full text

Patent

Loading…

Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode

by LOEWENHARDT PETER, KENNEDY WILLIAM S, TRUSSELL DAVID, FISCHER ANDREAS
Year of Publication 04.01.2011

Get full text

Patent

Loading…

PLASMA CONFINEMENT RING ASSEMBLIES HAVING REDUCED POLYMER DEPOSITION CHARACTERISTICS

by ROGERS, JAMES, H, DHINDSA, RAJINDER, KOZAKEVICH, FELIX, TRUSSELL, DAVID
Year of Publication 03.11.2010

Get full text

Patent

Loading…

Plasma processor with electrode responsive to multiple RF frequencies

by DHINDSA RAJ, KOZAKEVICH FELIX, TRUSSELL DAVID DOUGLAS
Year of Publication 30.01.2007

Get full text

Patent

Loading…

Plasma processor with electrode responsive to multiple RF frequencies

by Dhindsa, Raj, Kozakevich, Felix, Trussell, David Douglas
Year of Publication 30.01.2007

Get full text

Patent

Loading…

PLASMA CONFINEMENT RING ASSEMBLIES HAVING REDUCED POLYMER DEPOSITION CHARACTERISTICS

by ROGERS, JAMES, H, DHINDSA, RAJINDER, KOZAKEVICH, FELIX, TRUSSELL, DAVID
Year of Publication 29.05.2009

Get full text

Patent

Loading…

PLASMA CONFINEMENT RING ASSEMBLIES HAVING REDUCED POLYMER DEPOSITION CHARACTERISTICS

by ROGERS, JAMES, H, DHINDSA, RAJINDER, KOZAKEVICH, FELIX, TRUSSELL, DAVID
Year of Publication 16.04.2009

Get full text

Patent

Loading…

Process for cleaning a vacuum processing chamber including the gas injection port

by KOEMTZOPOULOS, C. ROBERT, KOZAKEVICH, FELIX, TRUSSELL, DAVID
Year of Publication 15.02.2006

Get full text

Patent

Loading…

Plasma confinement rings assemblies having reduced polymer deposition characteristics

by TRUSSELL DAVID, ROGERS JAMES H, DHINDSA RAJINDER, KOZAKEVICH FELIX
Year of Publication 25.12.2008

Get full text

Patent

Loading…

Wafer transport assembly with integrated buffers

by GOULD, RICHARD, PENA, CHRISTOPHER, KELLOGG, MICHAEL, DAUGHERTY, JOHN, KUNKEL, KLAY, TRUSSELL, DAVID
Year of Publication 01.08.2017

Get full text

Patent

Loading…

Service tunnel for use on capital equipment in semiconductor manufacturing and research fabs

by GOULD, RICHARD, PENA, CHRISTOPHER, KELLOGG, MICHAEL, DAUGHERTY, JOHN, KUNKEL, KLAY, TRUSSELL, DAVID
Year of Publication 01.08.2017

Get full text

Patent

Loading…

Service tunnel for use on capital equipment in semiconductor manufacturing and research FABs

by CHRISTOPHER PENA, MICHAEL KELLOGG, JOHN DAUGHERTY, RICHARD GOULD, KLAY KUNKEL, DAVID TRUSSELL
Year of Publication 28.07.2017

Get full text

Patent

Loading…

Plasma confinement ring assemblies having reduced polymer deposition characteristics

by Dhindsa, Rajinder, Kozakevich, Felix, Rogers, James H, Trussell, David
Year of Publication 07.10.2008

Get full text

Patent

Loading…

Plasma confinement ring assemblies having reduced polymer deposition characteristics

by TRUSSELL DAVID, ROGERS JAMES H, DHINDSA RAJINDER, KOZAKEVICH FELIX
Year of Publication 07.10.2008

Get full text

Patent

Loading…

PLASMA CONFINEMENT RING ASSEMBLIES HAVING REDUCED POLYMER DEPOSITION CHARACTERISTICS

by ROGERS, JAMES, H, DHINDSA, RAJINDER, KOZAKEVICH, FELIX, TRUSSELL, DAVID
Year of Publication 26.12.2007

Get full text

Patent

Loading…

PLASMA CONFINEMENT RING ASSEMBLIES HAVING REDUCED POLYMER DEPOSITION CHARACTERISTICS

by TRUSSELL DAVID, ROGERS JAMES H, DHINDSA RAJINDER, KOZAKEVICH FELIX
Year of Publication 03.12.2007

Get full text

Patent

Loading…

Chemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection ports

by Trussell, David, Koemtzopoulos, C. Robert, Kozakevich, Felix
Year of Publication 29.04.2003

Get full text

Patent

Loading…

Chemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection ports

by TRUSSELL DAVID, KOEMTZOPOULOS C. ROBERT, KOZAKEVICH FELIX
Year of Publication 29.04.2003

Get full text

Patent

Loading…

PLASMA CONFINEMENT RING ASSEMBLIES HAVING REDUCED POLYMER DEPOSITION CHARACTERISTICS

by ROGERS, JAMES, H, DHINDSA, RAJINDER, KOZAKEVICH, FELIX, TRUSSELL, DAVID
Year of Publication 28.09.2006

Get full text

Patent

Refine Results

Format

Subject Area

Topic

Language

Year of Publication

Database