PROCEDE DE POLISSAGE CMP UNIFORME
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Year of Publication 10.12.2021
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Year of Publication 10.12.2021
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Method of making composite polishing layer for chemical mechanical polishing pad
Lugo, Diego, Qian, Bainian, Miller, Jeffrey B, Wank, Andrew, Brugarolas Brufau, Teresa, Tran, Tony Quan, Stack, Marc R, Tong, Yuhua, Veneziale, David Michael, Hendron, Jeffrey James, Jacob, George C, Kozhukh, Julia
Year of Publication 09.10.2018
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Year of Publication 09.10.2018
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Method of making composite polishing layer for chemical mechanical polishing pad
Lugo, Diego, Qian, Bainian, Miller, Jeffrey B, Wank, Andrew, Brugarolas Brufau, Teresa, Tran, Tony Quan, Stack, Marc R, Tong, Yuhua, Veneziale, David Michael, Hendron, Jeffrey James, Jacob, George C, Kozhukh, Julia
Year of Publication 03.07.2018
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Year of Publication 03.07.2018
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Chemical mechanical polishing pad composite polishing layer formulation
Miller Jeffrey B, Stack Marc R, Hendron Jeffrey James, Brugarolas Brufau Teresa, Tran Tony Quan, Lugo Diego, Kozhukh Julia, Qian Bainian, Jacob George C
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Year of Publication 25.04.2017
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CHEMICAL MECHANICAL POLISHING PAD COMPOSITE POLISHING LAYER FORMULATION
Miller Jeffrey B, Stack Marc R, Hendron Jeffrey James, Brugarolas Brufau Teresa, Tran Tony Quan, Lugo Diego, Kozhukh Julia, Qian Bainian, Jacob George C
Year of Publication 29.12.2016
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Year of Publication 29.12.2016
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Chemical mechanical polishing pad and method of making same
Stack Marc R, Tran Tony Quan, Wank Andrew, Tong Yuhua, Lugo Diego, Veneziale David Michael, DeGroot Marty W, Jacob George C, Miller Jeffrey B, Brugarolas Brufau Teresa, Yeh Fengji, Kozhukh Julia, Qian Bainian
Year of Publication 03.10.2017
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Year of Publication 03.10.2017
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Chemical mechanical polishing pad and method of making same
Stack Marc R, Tran Tony Quan, Wank Andrew, Tong Yuhua, Lugo Diego, Veneziale David Michael, DeGroot Marty W, Jacob George C, Miller Jeffrey B, Brugarolas Brufau Teresa, Yeh Fengji, Kozhukh Julia, Qian Bainian
Year of Publication 07.03.2017
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Year of Publication 07.03.2017
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METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD
Miller Jeffrey B, Stack Marc R, Hendron Jeffrey James, Brugarolas Brufau Teresa, Tran Tony Quan, Wank Andrew, Tong Yuhua, Lugo Diego, Kozhukh Julia, Veneziale David Michael, Qian Bainian, Jacob George C
Year of Publication 29.12.2016
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Year of Publication 29.12.2016
Patent
METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD
Miller Jeffrey B, Stack Marc R, Hendron Jeffrey James, Brugarolas Brufau Teresa, Tran Tony Quan, Wank Andrew, Tong Yuhua, Lugo Diego, Kozhukh Julia, Veneziale David Michael, Qian Bainian, Jacob George C
Year of Publication 29.12.2016
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Year of Publication 29.12.2016
Patent
CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME
Stack Marc R, Tran Tony Quan, Wank Andrew, Tong Yuhua, Lugo Diego, Veneziale David Michael, DeGroot Marty W, Jacob George C, Miller Jeffrey B, Brugarolas Brufau Teresa, Yeh Fengji, Kozhukh Julia, Qian Bainian
Year of Publication 29.12.2016
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Year of Publication 29.12.2016
Patent
CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME
Stack Marc R, Tran Tony Quan, Wank Andrew, Tong Yuhua, Lugo Diego, Veneziale David Michael, DeGroot Marty W, Jacob George C, Miller Jeffrey B, Brugarolas Brufau Teresa, Yeh Fengji, Kozhukh Julia, Qian Bainian
Year of Publication 29.12.2016
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Year of Publication 29.12.2016
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High-rate CMP polishing method
NGUYEN, JOHN VU, STACK, JEFFREY ROBERT, HENDRON, JEFFREY JAMES, TRAN, TONY QUAN
Year of Publication 01.03.2019
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Year of Publication 01.03.2019
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Uniform CMP polishing method
NGUYEN, JOHN VU, STACK, JEFFREY ROBERT, HENDRON, JEFFREY JAMES, TRAN, TONY QUAN
Year of Publication 01.02.2019
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Year of Publication 01.02.2019
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Controlled residence CMP polishing method
NGUYEN, JOHN VU, STACK, JEFFREY ROBERT, HENDRON, JEFFREY JAMES, TRAN, TONY QUAN
Year of Publication 01.02.2019
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Year of Publication 01.02.2019
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Biased pulse CMP groove pattern
NGUYEN, JOHN VU, STACK, JEFFREY ROBERT, HENDRON, JEFFREY JAMES, TRAN, TONY QUAN
Year of Publication 01.02.2019
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Year of Publication 01.02.2019
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Trapezoidal CMP groove pattern
NGUYEN, JOHN VU, STACK, JEFFREY ROBERT, HENDRON, JEFFREY JAMES, TRAN, TONY QUAN
Year of Publication 01.02.2019
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Year of Publication 01.02.2019
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HIGH-RATE CMP POLISHING METHOD
NGUYEN, JOHN VU, STACK, JEFFREY ROBERT, HENDRON, JEFFREY JAMES, TRAN, TONY QUAN
Year of Publication 25.12.2018
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Year of Publication 25.12.2018
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Trapezoidal CMP groove pattern
NGUYEN, JOHN VU, STACK, JEFFREY ROBERT, HENDRON, JEFFREY JAMES, TRAN, TONY QUAN
Year of Publication 25.12.2018
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Year of Publication 25.12.2018
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Uniform CMP polishing method
NGUYEN, JOHN VU, STACK, JEFFREY ROBERT, HENDRON, JEFFREY JAMES, TRAN, TONY QUAN
Year of Publication 25.12.2018
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Year of Publication 25.12.2018
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Controlled residence CMP polishing method
STACK, JEFFREY ROBERT, NGUYEN, JOHN VU, HENDRON, JEFFREY JAMES, TRAN, TONY QUAN
Year of Publication 25.12.2018
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Year of Publication 25.12.2018
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