Microfabrication Technique by Gas Plasma Etching Method
Komiya, Hiroyoshi, Toyoda, Hiroyasu, Kato, Tadao, Inaba, Kumiko
Published in Japanese Journal of Applied Physics (01.01.1976)
Published in Japanese Journal of Applied Physics (01.01.1976)
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Journal Article
The Baking of a Photoresist Using Microwave Power
TOYODA, Hiroyasu, ABE, Haruhiko, MINOURA, Tomio
Published in Journal of The Society of Photographic Science and Technology of Japan (25.02.1975)
Published in Journal of The Society of Photographic Science and Technology of Japan (25.02.1975)
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Journal Article
Relationship between Molecular Weight and Exposure Characteristics of Dichromated Gelatin (DCG)
ENDO, Atsushi, YADA, Toshio, MAEJIMA, Taro, TOYODA, Hiroyasu, UEMATSU, Shigeyuki, SAEKI, Hideo
Published in Journal of The Society of Photographic Science and Technology of Japan (1984)
Published in Journal of The Society of Photographic Science and Technology of Japan (1984)
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Journal Article
Etching of SiO 2 in CF 4 Gas Plasma Using Planar-Type Reactor
Toyoda, Hiroyasu, Itakura, Hideaki, Komiya, Hiroyoshi
Published in Japanese Journal of Applied Physics (01.03.1981)
Published in Japanese Journal of Applied Physics (01.03.1981)
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Journal Article
Plasma Etching of SiO 2 Relief Having Tapered Wall
Itakura, Hideaki, Komiya, Hiroyoshi, Toyoda, Hiroyasu
Published in Japanese Journal of Applied Physics (01.07.1980)
Published in Japanese Journal of Applied Physics (01.07.1980)
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