Rapid resist ashing by slot-excited atmospheric pressure microwave O2 plasma
Toyoda, Hirotaka, Ishikawa, Shota, Suzuki, Haruka, Honda, Takeshi
Published in Japanese Journal of Applied Physics (06.11.2019)
Published in Japanese Journal of Applied Physics (06.11.2019)
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Journal Article
Atmospheric pressure water-vapor plasma in an air-shielded environment by water flow
Senba, Hikaru, Suzuki, Haruka, Toyoda, Hirotaka
Published in Japanese Journal of Applied Physics (01.02.2019)
Published in Japanese Journal of Applied Physics (01.02.2019)
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Journal Article
Rapid plasma treatment of polyimide for improved adhesive and durable copper film deposition
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Journal Article
Conference Proceeding
Time-dependent measurement of charge density on the bottom of high aspect capillary hole in pulse-modulated VHF capacitively coupled Ar plasma
Moriyama, Makoto, Nakahara, Naoya, Kurihara, Kazuaki, Iino, Daiki, Fukumizu, Hiroyuki, Suzuki, Haruka, Toyoda, Hirotaka
Published in Japanese Journal of Applied Physics (01.01.2021)
Published in Japanese Journal of Applied Physics (01.01.2021)
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Journal Article
Angular distribution measurement of high-energy argon neutral and ion in a 13.56 MHz capacitively-coupled plasma
Ichikawa, Keita, Chu, Manh Hung, Moriyama, Makoto, Nakahara, Naoya, Suzuki, Haruka, Iino, Daiki, Fukumizu, Hiroyuki, Kurihara, Kazuaki, Toyoda, Hirotaka
Published in Applied physics express (01.12.2021)
Published in Applied physics express (01.12.2021)
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Journal Article
High performance of carbon nanowall supported Pt catalyst for methanol electro-oxidation
Zhang, Chengxu, Hu, Jue, Wang, Xiangke, Zhang, Xiaodong, Toyoda, Hirotaka, Nagatsu, Masaaki, Meng, Yuedong
Published in Carbon (New York) (01.08.2012)
Published in Carbon (New York) (01.08.2012)
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Journal Article
Evaluation of absolute charge density at the bottom of high aspect capillary holes exposed to a pulsed very high frequency plasma
Moriyama, Makoto, Nakahara, Naoya, Mitsuya, Akihiro, Suzuki, Haruka, Kurihara, Kazuaki, Iino, Daiki, Fukumizu, Hiroyuki, Toyoda, Hirotaka
Published in Japanese Journal of Applied Physics (01.06.2020)
Published in Japanese Journal of Applied Physics (01.06.2020)
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Journal Article
New line plasma source excited by 2.45 GHz microwave at atmospheric pressure
Suzuki, Haruka, Nakano, Suguru, Itoh, Hitoshi, Sekine, Makoto, Hori, Masaru, Toyoda, Hirotaka
Published in Applied physics express (01.03.2015)
Published in Applied physics express (01.03.2015)
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Journal Article
The Mechanism of Anti-Epileptogenesis by Levetiracetam Treatment is Similar to the Spontaneous Recovery of Idiopathic Generalized Epilepsy during Adolescence
Kikuyama, Hiroki, Hanaoka, Tadahito, Kanazawa, Tetsufumi, Yoshida, Yasushi, Mizuno, Takafumi, Toyoda, Hirotaka, Yoneda, Hiroshi
Published in Psychiatry investigation (01.11.2017)
Published in Psychiatry investigation (01.11.2017)
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Journal Article
Magnetron sputtering of platinum nanoparticles onto vertically aligned carbon nanofibers for electrocatalytic oxidation of methanol
Zhang, Chengxu, Hu, Jue, Nagatsu, Masaaki, Shu, Xingsheng, Toyoda, Hirotaka, Fang, Shidong, Meng, Yuedong
Published in Electrochimica acta (01.07.2011)
Published in Electrochimica acta (01.07.2011)
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Journal Article
Characterization of a steam plasma jet at atmospheric pressure
GUOHUA NI, PENG ZHAO, CHENG CHENG, YE SONG, TOYODA, Hirotaka, YUEDONG MENG
Published in Plasma sources science & technology (01.02.2012)
Published in Plasma sources science & technology (01.02.2012)
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Journal Article
High H Radical Density Produced by 1-m-Long Atmospheric Pressure Microwave Plasma System
Itoh, Hitoshi, Kubota, Yusuke, Kashiwagi, Yusaku, Takeda, Keigo, Ishikawa, Kenji, Kondo, Hiroki, Toyoda, Hirotaka, Hori, Masaru
Published in Japanese Journal of Applied Physics (01.11.2013)
Published in Japanese Journal of Applied Physics (01.11.2013)
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Journal Article
High-Performance Plasma-Polymerized Alkaline Anion-Exchange Membranes for Potential Application in Direct Alcohol Fuel Cells
Zhang, Chengxu, Hu, Jue, Nagatsu, Masaaki, Meng, Yuedong, Shen, Wei, Toyoda, Hirotaka, Shu, Xingsheng
Published in Plasma processes and polymers (23.11.2011)
Published in Plasma processes and polymers (23.11.2011)
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Journal Article
Influence of Oxygen Addition and Wafer Bias Voltage on Bromine Atom Surface Reaction in a HBr/Ar Inductively Coupled Plasma
Iino, Daiki, Nojiri, Yasuhiro, Suzuki, Keiji, Oike, Takumi, Fujii, Yoshitaka, Toyoda, Hirotaka
Published in Japanese Journal of Applied Physics (01.11.2013)
Published in Japanese Journal of Applied Physics (01.11.2013)
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Journal Article