Comparison of quartz and silicon as a master mold substrate for patterned media UV-NIL replica process
Hoga, Morihisa, Itoh, Kimio, Ishikawa, Mikio, Kuwahara, Naoko, Fukuda, Masaharu, Toyama, Nobuhito, Kurokawa, Syuhei, Doi, Toshiro
Published in Microelectronic engineering (01.08.2011)
Published in Microelectronic engineering (01.08.2011)
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Conference Proceeding
Double Patterning Analysis Method by Emulation Using a Double-Exposure Technique
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Published in Japanese Journal of Applied Physics (01.03.2010)
Published in Japanese Journal of Applied Physics (01.03.2010)
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DIFFRACTION OPTICAL ELEMENT, OPTICAL IRRADIATION DEVICE, AND IRRADIATION PATTERN READING METHOD
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Year of Publication 10.01.2019
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POLARIZER POLARIZER MANUFACTURING METHOD OPTICAL ALIGNMENT DEVICE AND MOUNTING METHOD OF POLARIZER
OOKAWA YASUHIRO, SASAMOTO KAZUO, TOYAMA NOBUHITO, INAZUKI YUICHI, SHIBATA AKIHIKO
Year of Publication 04.09.2018
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Year of Publication 04.09.2018
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POLARIZER, POLARIZER MANUFACTURING METHOD, OPTICAL ALIGNMENT DEVICE AND MOUNTING METHOD OF POLARIZER
OOKAWA YASUHIRO, SASAMOTO KAZUO, TOYAMA NOBUHITO, INAZUKI YUICHI, SHIBATA AKIHIKO
Year of Publication 07.09.2016
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Year of Publication 07.09.2016
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POLARIZER AND OPTICAL ALIGNMENT DEVICE
SASAMOTO, KAZUO, TOYAMA, NOBUHITO, OKAWA, YASUHIRO, INAZUKI, YUICHI, SAITO, HIROFUMI
Year of Publication 28.01.2016
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Year of Publication 28.01.2016
Patent