POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING
NEISSER, Mark, O, HISHIDA, Aritaka, WU, Hengpeng, KATAYAMA, Tomohide, TOUKHY, Medhat, A, DING-LEE, Shuji, S, KANG, Wen-Bing, OBERLANDER, Joseph, E, SUI, Yu
Year of Publication 14.11.2018
Get full text
Year of Publication 14.11.2018
Patent
NOVOLAK/DNQ BASED, CHEMICALLY AMPLIFIED PHOTORESIST
CHEN HUNG-YANG, YIN JIAN, KUDO TAKANORI, LIU WEIHONG, TOUKHY MEDHAT A
Year of Publication 01.01.2021
Get full text
Year of Publication 01.01.2021
Patent
POSITIVE WORKING PHOTOSENSITIVE MATERIAL
LU, PINGHUNG, TOUKHY, MEDHAT A, LIU, WEIHONG, LAI, SOOKMEE, HISHIDA, ARITAKA, SAKURAI, YOSHIHARU
Year of Publication 14.10.2015
Get full text
Year of Publication 14.10.2015
Patent
POSITIVE WORKING PHOTOSENSITIVE MATERIAL
LU, PINGHUNG, TOUKHY, MEDHAT A, LIU, WEIHONG, LAI, SOOKMEE, HISHIDA, ARITAKA, SAKURAI, YOSHIHARU
Year of Publication 27.07.2015
Get full text
Year of Publication 27.07.2015
Patent
POSITIVE WORKING PHOTOSENSITIVE MATERIAL
HISHIDA, Aritaka, LAI, SookMee, SAKURAI, Yoshiharu, TOUKHY, Medhat A, LU, PingHung, LIU, Weihong
Year of Publication 27.07.2015
Get full text
Year of Publication 27.07.2015
Patent
Positive working photosensitive material
LU PINGHUNG, LIU WEIHONG, LAI SOOKME, SAKURAI YOSHIHARU, TOUKHY MEDHAT A, HISHIDA ARITAKA
Year of Publication 15.07.2015
Get full text
Year of Publication 15.07.2015
Patent
POSITIVE WORKING PHOTOSENSITIVE MATERIAL
LU, PINGHUNG, TOUKHY, MEDHAT A, LIU, WEIHONG, LAI, SOOKMEE, HISHIDA, ARITAKA, SAKURAI, YOSHIHARU
Year of Publication 29.04.2015
Get full text
Year of Publication 29.04.2015
Patent
NEGATIVE-WORKING THICK FILM PHOTORESIST
LU, PINGHUNG, KIM, SANGCHUL, TOUKHY, MEDHAT A, LIU, WEIHONG, CHEN, CHUNWEI, LAI, SOOKMEE
Year of Publication 22.04.2015
Get full text
Year of Publication 22.04.2015
Patent
POSITIVE PHOTOSENSITIVE MATERIAL
LU, PINGHUNG, TOUKHY, MEDHAT A, LIU, WEIHONG, CHEN, CHUNWEI, LAI, SOOKMEE, MEYER, STEPHEN
Year of Publication 22.04.2015
Get full text
Year of Publication 22.04.2015
Patent
Positive photosensitive material
CHEN CHUNWEI, MEYER STEPHEN, LIU WEIHONG, LAI SOOKMEE, LU BINGHONG, TOUKHY MEDHAT A
Year of Publication 25.02.2015
Get full text
Year of Publication 25.02.2015
Patent
Negative-working thick film photoresist
CHEN CHUNWEI, LU PINGHUNG, KIM SANGCHUL, LIU WEIHONG, LAI SOOKME, TOUKHY MEDHAT A
Year of Publication 18.02.2015
Get full text
Year of Publication 18.02.2015
Patent
POSITIVE WORKING PHOTOSENSITIVE MATERIAL
LU, PINGHUNG, TOUKHY, MEDHAT A, LIU, WEIHONG, LAI, SOOKME, HISHIDA, ARITAKA, SAKURAI, YOSHIHARU
Year of Publication 18.12.2014
Get full text
Year of Publication 18.12.2014
Patent