Reduction of semiconductor process emissions by reactive gas optimization
Vartanian, V., Goolsby, B., Chatterjee, R., Kachmarik, R., Babbitt, D., Reif, R., Tonnis, E.J., Graves, D.
Published in IEEE transactions on semiconductor manufacturing (01.11.2004)
Published in IEEE transactions on semiconductor manufacturing (01.11.2004)
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Journal Article
A systematic methodology for etch chamber matching to meet leading edge requirements
Hwang, Stephen, Tonnis, Eric
Published in 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) (01.05.2014)
Published in 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) (01.05.2014)
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Conference Proceeding
SYSTEM, METHOD AND APPARATUS FOR RF POWER COMPENSATION IN PLASMA ETCH CHAMBER
CHOU SHANG I, RAMACHANDRAN SEETHARAMAN, SATO ARTHUR, TONNIS ERIC, O'NEILL ROBERT G
Year of Publication 03.12.2014
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Year of Publication 03.12.2014
Patent