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LEE, JOON GON, TOMITA RYUJI, KIM, CHUL SUNG, LEE, DO SUN, LEE, DO HYUN
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Improvement on sheet resistance uniformity of nickel silicide by optimization of silicidation conditions
Tomita, R., Kimura, H., Yasuda, M., Maeda, K., Ueno, S., Tonegawa, T., Fujimoto, T., Moritoki, M., Iwai, H.
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Published in Microelectronics and reliability (01.05.2013)
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Year of Publication 02.04.2018
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Year of Publication 02.04.2018
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Formation of high resistivity phases of nickel silicide at small area
Tomita, R., Kimura, H., Yasuda, M., Maeda, K., Ueno, S., Tomizawa, T., Kunimune, Y., Nakamura, H., Moritoki, M., Iwai, H.
Published in Microelectronics and reliability (01.05.2013)
Published in Microelectronics and reliability (01.05.2013)
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Semiconductor devices having reduced contact resistance
Choi, Hyo Seok, Kim, Chul Sung, Lee, Joon Gon, Tomita, Ryuji, Lee, Jae Eun
Year of Publication 25.06.2019
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Year of Publication 25.06.2019
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Integrated circuit device
Lee, Do-Sun, Kim, Chul-sung, Tomita, Ryuji, Lee, Do-hyun, Lee, Joon-gon
Year of Publication 16.04.2019
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Year of Publication 16.04.2019
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