Impact of Pulse Parameters of a DC Power Generator on the Microstructural and Mechanical Properties of Sputtered AlN Film with In-Situ OES Data Analysis
Zhou, Wei-Yu, Chen, Hsuan-Fan, Tseng, Xue-Li, Lo, Hsiao-Han, Wang, Peter J, Jiang, Ming-Yu, Fuh, Yiin-Kuen, Li, Tomi T
Published in Materials (11.04.2023)
Published in Materials (11.04.2023)
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Journal Article
A multi-step deposited AlN films in a DC pulsed sputtering and film characteristics classification with principal component analysis of OES data
Chen, Wei-Lun, Zhou, Wei-Yu, Yuan, Ning-Hsiu, Yang, Shang-Shian, Wang, Peter J., Lo, Hsiao-Han, Li, Tomi T., Fuh, Yiin-kuen
Published in International journal of advanced manufacturing technology (01.07.2023)
Published in International journal of advanced manufacturing technology (01.07.2023)
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Journal Article
A Comparison and Analysis of Three Methods of Aluminum Crown Forgings in Processing Optimization
Chen, Chi-Peng, Su, Hui-Zhen, Shih, Jyun-Kai, Huang, Cheng-Fu, Ku, Hao-Yun, Chan, Chien-Wei, Li, Tomi-T, Fuh, Yiin-Kuen
Published in Materials (25.11.2022)
Published in Materials (25.11.2022)
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Journal Article
Evolution of a-Si:H to nc-Si:H transition of hydrogenated silicon films deposited by trichlorosilane using principle component analysis of optical emission spectroscopy
Wang, Song-Ho, Chang, Hsueh-Er, Lee, Chien-Chieh, Fuh, Yiin-Kuen, Li, Tomi T.
Published in Materials chemistry and physics (15.01.2020)
Published in Materials chemistry and physics (15.01.2020)
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Journal Article
Machine Learning Assisted Classification of Aluminum Nitride Thin Film Stress via In-Situ Optical Emission Spectroscopy Data
Yang, Yu-Pu, Lu, Te-Yun, Lo, Hsiao-Han, Chen, Wei-Lun, Wang, Peter J., Lai, Walter, Fuh, Yiin-Kuen, Li, Tomi T.
Published in Materials (08.08.2021)
Published in Materials (08.08.2021)
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Residual stress classification of pulsed DC reactive sputtered aluminum nitride film via large-scale data analysis of optical emission spectroscopy
Lo, Hsiao-Han, Chen, Wei-Lun, Wang, Peter J., Lai, Walter, Fuh, Yiin-Kuen, Li, Tomi T.
Published in International journal of advanced manufacturing technology (01.04.2022)
Published in International journal of advanced manufacturing technology (01.04.2022)
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Journal Article
Minimizing film residual stress with in situ OES big data using principal component analysis of deposited AlN films by pulsed DC reactive sputtering
Lu, Te-Yun, Yang, Yu-Pu, Lo, Hsiao-Han, Wang, Peter J., Lai, Walter, Fuh, Yiin-Kuen, Li, Tomi T.
Published in International journal of advanced manufacturing technology (01.06.2021)
Published in International journal of advanced manufacturing technology (01.06.2021)
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Journal Article
Large-scale data analysis of PECVD amorphous silicon interface passivation layer via the optical emission spectra for parameterized PCA
Huang, Hung-Jui, Kau, Li-Han, Wang, Ho-Song, Hsieh, Yu-Lin, Lee, Chien-Chieh, Fuh, Yiin-Kuen, Li, Tomi T.
Published in International journal of advanced manufacturing technology (01.03.2019)
Published in International journal of advanced manufacturing technology (01.03.2019)
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In Situ Plasma Monitoring of PECVD nc-Si:H Films and the Influence of Dilution Ratio on Structural Evolution
Hsieh, Yu-Lin, Kau, Li-Han, Huang, Hung-Jui, Lee, Chien-Chieh, Fuh, Yiin-Kuen, Li, Tomi
Published in Coatings (Basel) (06.07.2018)
Published in Coatings (Basel) (06.07.2018)
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Investigation of hydrogenated amorphous silicon as passivation layer by high density plasma
Chu, Yen-Ho, Lee, Chien-Chieh, Chang, Teng-Hsiang, Chang, Shan-Yuan, Chang, Jenq-Yang, Li, Tomi, Chen, I-Chen
Published in Thin solid films (03.11.2014)
Published in Thin solid films (03.11.2014)
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Conference Proceeding
Low temperature growth of highly conductive boron-doped germanium thin films by electron cyclotron resonance chemical vapor deposition
Chang, Teng-Hsiang, Chang, Chiao, Chu, Yen-Ho, Lee, Chien-Chieh, Chang, Jenq-Yang, Chen, I-Chen, Li, Tomi
Published in Thin solid films (31.01.2014)
Published in Thin solid films (31.01.2014)
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Investigation of the amorphous to microcrystalline phase transition of thin film prepared by electron cyclotron resonance chemical vapor deposition method
CHANG, Teng-Hsiang, CHANG, Jenq-Yang, CHU, Yen-Ho, LEE, Chien-Chieh, CHEN, I-Chen, TOMI LI
Published in Surface & coatings technology (01.09.2013)
Published in Surface & coatings technology (01.09.2013)
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Conference Proceeding
Journal Article
Investigation of interface quality and passivation improvement with a-SiO:H deposited by ECRCVD at low temperature
Chu, Yen-Ho, Lee, Chien-Chieh, Chang, Teng-Hsiang, Hsieh, Yu-Lin, Liu, Shian-Ming, Chang, Jenq-Yang, Li, Tomi T., Chen, I-Chen
Published in Journal of non-crystalline solids (15.03.2015)
Published in Journal of non-crystalline solids (15.03.2015)
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