GAS ADSORBENT AND GAS SEPARATION DEVICE AND GAS STORAGE DEVICE
KAJIRO HIROSHI, KON HIROKI, KITAGAWA SUSUMU, MATSUDA RYOTARO, TOKUMARU SHINJI
Year of Publication 27.10.2016
Get full text
Year of Publication 27.10.2016
Patent
FLUORINE-CONTAINING COORDINATABLE COMPLEX OR SALT THEREOF, GAS ADSORBING MATERIAL AND PRODUCTION METHOD THEREOF, AND GAS SEPARATION APPARATUS AND GAS STORAGE APPARATUS EACH OBTAINED BY USING THE MATERIAL
KAJIRO HIROSHI, KITAGAWA SUSUMU, MATSUDA RYOTARO, SATO HIROSHI, TOKUMARU SHINJI
Year of Publication 23.07.2015
Get full text
Year of Publication 23.07.2015
Patent
FLUORINE-CONTAINING COORDINATION HIGH MOLECULE COMPLEX AND MANUFACTURING METHOD THEREOF, GAS ADSORBENT, AND GAS SEPARATION APPARATUS AND GAS STORAGE APPARATUS USING THE SAME
KAJIRO HIROSHI, KITAGAWA SUSUMU, MATSUDA RYOTARO, SATO HIROSHI, TOKUMARU SHINJI
Year of Publication 07.05.2015
Get full text
Year of Publication 07.05.2015
Patent
LAMINATE FOR ORGANIC EL ELEMENT AND MANUFACTURING METHOD FOR THE SAME
TAKEUCHI MASAHIKO, YAMADA NORIKO, TOKUMARU SHINJI, YAMAGUCHI SAWAKO, II SHOICHI, HAYASHI NOBUYUKI
Year of Publication 13.04.2017
Get full text
Year of Publication 13.04.2017
Patent
METAL LAMINATE SUBSTRATE FOR ORGANIC EL ELEMENT AND MANUFACTURING METHOD FOR THE SAME
TAKEUCHI MASAHIKO, YAMADA NORIKO, TOKUMARU SHINJI, YAMAGUCHI SAWAKO, II SHOICHI, HAYASHI NOBUYUKI
Year of Publication 13.04.2017
Get full text
Year of Publication 13.04.2017
Patent
METHOD FOR MANUFACTURING HIGHLY PURE SILICON, HIGHLY PURE SILICON OBTAINED BY THIS METHOD, AND SILICON RAW MATERIAL FOR MANUFACTURING HIGHLY PURE SILICON
HIYOSHI MASATAKA, DOHNOMAE HITOSHI, NAKAZAWA SHIGERU, ONOUE KOZO, TOKUMARU SHINJI, KISHIDA YUTAKA, KONDO JIRO
Year of Publication 12.09.2013
Get full text
Year of Publication 12.09.2013
Patent