Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etching
Banna, S., Agarwal, A., Tokashiki, K., Hong Cho, Rauf, S., Todorow, V., Ramaswamy, K., Collins, K., Stout, P., Jeong-Yun Lee, Junho Yoon, Kyoungsub Shin, Sang-Jun Choi, Han-Soo Cho, Hyun-Joong Kim, Changhun Lee, Lymberopoulos, D.
Published in IEEE transactions on plasma science (01.09.2009)
Published in IEEE transactions on plasma science (01.09.2009)
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Journal Article
Advanced gate etching for accurate CD control for 130-nm node ASIC manufacturing
Nagase, M., Tokashiki, K.
Published in IEEE transactions on semiconductor manufacturing (01.08.2004)
Published in IEEE transactions on semiconductor manufacturing (01.08.2004)
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Conference Proceeding
Influence of Process chamber ambient on SiOC (k=2.9) ILD Cu damascene ashing
Tokashiki, K., Maruyama, T., Nishizawa, A.
Published in IEEE transactions on semiconductor manufacturing (01.08.2004)
Published in IEEE transactions on semiconductor manufacturing (01.08.2004)
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Conference Proceeding
Efficacy of Nivolumab and Pembrolizumab in Platinum-sensitive Recurrent or Metastatic Head and Neck Squamous Cell Carcinoma
Yamashita, Gai, Okamoto, Isaku, Ito, Tatsuya, Tokashiki, Kunihiko, Okada, Takuro, Tsukahara, Kiyoaki
Published in Anticancer research (01.08.2023)
Published in Anticancer research (01.08.2023)
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Journal Article
Effects of angiotensin receptor blockade (ARB) on mortality and cardiovascular outcomes in patients with long-term haemodialysis: a randomized controlled trial
Iseki, Kunitoshi, Arima, Hisatomi, Kohagura, Kentaro, Komiya, Ichiro, Ueda, Shinichiro, Tokuyama, Kiyoyuki, Shiohira, Yoshiki, Uehara, Hajime, Toma, Shigeki
Published in Nephrology, dialysis, transplantation (01.06.2013)
Published in Nephrology, dialysis, transplantation (01.06.2013)
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A 500-MHz 4-Mb CMOS pipeline-burst cache SRAM with point-to-point noise reduction coding I/O
Nakamura, K., Takeda, K., Toyoshima, H., Noda, K., Ohkubo, H., Uchida, T., Shimizu, T., Itani, T., Tokashiki, K., Kishimoto, K.
Published in IEEE journal of solid-state circuits (01.11.1997)
Published in IEEE journal of solid-state circuits (01.11.1997)
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Journal Article
Dry etching of bottom anti-reflective-coat and its application to gate length control
Nishizawa, A., Tokashiki, K., Horiba, S., Miyamoto, H.
Published in 1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023) (1997)
Published in 1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023) (1997)
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Conference Proceeding
Process integration technology for low process complexity BiCMOS using trench collector sink
Yoshida, H., Suzuki, H., Kinoshita, Y., Imai, K., Akimoto, T., Tokashiki, K., Yamazaki, T.
Published in Proceedings of IEEE Bipolar/BiCMOS Circuits and Technology Meeting (1994)
Published in Proceedings of IEEE Bipolar/BiCMOS Circuits and Technology Meeting (1994)
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Conference Proceeding
RuO2/TiN-based storage electrodes for (Ba, Sr)TiO3 dynamic random access memory capacitors
TAKEMURA, K, YAMAMICHI, S, LESAICHERRE, P.-Y, TOKASHIKI, K, MIYAMOTO, H, ONO, H, MIYASAKA, Y, YOSHIDA, M
Published in Japanese journal of applied physics (1995)
Published in Japanese journal of applied physics (1995)
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A stacked capacitor technology with ECR plasma MOCVD (Ba,Sr)TiO/sub 3/ and RuO/sub 2//Ru/TiN/TiSi/sub x/ storage nodes for Gb-scale DRAMs
Yamamichi, S., Lesaicherre, P., Yamaguchi, H., Takemura, K., Sone, S., Yabuta, H., Sato, K., Tamura, T., Nakajima, K., Ohnishi, S., Tokashiki, K., Hayashi, Y., Kato, Y., Miyasaka, Y., Yoshida, M., Ono, H.
Published in IEEE transactions on electron devices (01.07.1997)
Published in IEEE transactions on electron devices (01.07.1997)
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Journal Article
A stacked capacitor technology with ECR plasma MOCVD(Ba, Sr)TiO(3) and RuO(2)/Ru/TiN/TiSi(x)storage nodes for Gb-scale DRAMs
Yamamichi, S, Lesaicherre, P, Yamaguchi, H, Takemura, K, Sone, S, Yabuta, H, Sato, K, Tamura, T, Nakajima, K, Ohnishi, S, Tokashiki, K, Hayashi, Y, Kato, Y, Miyasaka, Y, Yoshida, M, Ono, H
Published in IEEE transactions on electron devices (01.07.1997)
Published in IEEE transactions on electron devices (01.07.1997)
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Journal Article
A 500 MHz 4 Mb CMOS pipeline-burst cache SRAM with point-to-point noise reduction coding I/O
Nakamura, K., Takeda, K., Toyoshima, H., Noda, K., Ohkubo, H., Uchida, T., Shimizu, T., Itani, T., Tokashiki, K., Kishimoto, K.
Published in 1997 IEEE International Solids-State Circuits Conference. Digest of Technical Papers (01.01.1997)
Published in 1997 IEEE International Solids-State Circuits Conference. Digest of Technical Papers (01.01.1997)
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Journal Article
Influence of halogen plasma atmosphere on SiO2 etching characteristics
TOKASHIKI, K, IKAWA, E, HASHIMOTO, T, KIKKAWA, T, TERAOKA, Y, NISHIYAMA, I
Published in Japanese journal of applied physics (01.11.1991)
Published in Japanese journal of applied physics (01.11.1991)
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Journal Article
Effect of electron temperature and electron density on topography dependent charging (TDC) damage in inductively coupled plasma etching tool
Tokashiki, K., Araki, M., Nagase, M., Noguchi, K., Miyamoto, H., Horiuchi, T.
Published in 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) (1998)
Published in 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) (1998)
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Conference Proceeding
Characterization of sputter-deposited (Ba,Sr)TiO/sub 3/ thin films on the sidewalls of fine-patterned electrodes
Yamamichi, S., Takemura, K., Sakuma, T., Watanabe, H., Ono, H., Tokashiki, K., Ikawa, E., Miyasaka, Y.
Published in Proceedings of 1994 IEEE International Symposium on Applications of Ferroelectrics (1994)
Published in Proceedings of 1994 IEEE International Symposium on Applications of Ferroelectrics (1994)
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