Dynamic micromagnetic field measurement by stroboscopic electron beam tomography
Shinada, H., Fukuhara, S., Seitou, S., Todokoro, H., Otomo, S., Takano, H., Shiiki, K.
Published in IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States) (01.03.1992)
Published in IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States) (01.03.1992)
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Conference Proceeding
A study on the field distribution of thin-film heads
Takano, H., Shinada, H., Seitou, S., Fukuhara, S., Ohnishi, T., Otomo, S., Todokoro, H., Shiiki, K.
Published in IEEE transactions on magnetics (01.03.1992)
Published in IEEE transactions on magnetics (01.03.1992)
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Journal Article
Conference Proceeding
E-beam correction methods for cell projection optical system
Itoh, H., Sasaki, M., Todokoro, H., Sohda, Y., Nakayama, Y., Saitou, N.
Published in Microelectronic engineering (01.04.1993)
Published in Microelectronic engineering (01.04.1993)
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Journal Article
Time-resolved measurement of micro-magnetic field by stroboscopic electron beam tomography
Shinada, H., Suzuki, H., Sasaki, S., Todokoro, H., Takano, H., Shiiki, K.
Published in IEEE transactions on magnetics (01.09.1992)
Published in IEEE transactions on magnetics (01.09.1992)
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Journal Article
Conference Proceeding
E-beam fault diagnosis system for logic VLSIs
Yamaguchi, N., Sakamoto, T., Nishioka, H., Majima, T., Satou, T., Shinada, H., Todokoro, H., Yamada, O.
Published in Microelectronic engineering (01.03.1992)
Published in Microelectronic engineering (01.03.1992)
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Journal Article
Progress in EB-cell projection lithography
Saitou, N., Moriyama, S., Okazaki, S., Matsuoka, G., Murai, F., Sakitani, Y., Yoda, H., Todokoro, H., Shibata, Y., Yamazaki, T.
Published in Microelectronic engineering (01.03.1992)
Published in Microelectronic engineering (01.03.1992)
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Electron beam tester for logic LSIs
Todokoro, H., Fukuhara, S., Seitou, S., Shinada, H., Yamaguchi, N.
Published in Microelectronic engineering (1989)
Published in Microelectronic engineering (1989)
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Direct observation of molecular alignment in an intense laser field by pulsed gas electron diffraction I: observation of anisotropic diffraction image
Hoshina, Kennosuke, Yamanouchi, Kaoru, Ohshima, Takashi, Ose, Yoichi, Todokoro, Hideo
Published in Chemical physics letters (13.02.2002)
Published in Chemical physics letters (13.02.2002)
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Journal Article
Direct observation of molecular alignment in an intense laser field by pulsed gas electron diffraction II: analysis of anisotropic diffraction image
Hoshina, Kennosuke, Yamanouchi, Kaoru, Ohshima, Takashi, Ose, Yoichi, Todokoro, Hideo
Published in Chemical physics letters (13.02.2002)
Published in Chemical physics letters (13.02.2002)
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Journal Article
Symposium; dynamic observation of metals
Maeda, M, Tsuba, K, Komoda, T, Todokoro, H, Sugata, E
Published in Journal of electron microscopy (1970)
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Published in Journal of electron microscopy (1970)
Journal Article
A nondestructive analysis technique for residual thin films in deep-submicron contact holes
Ninomiya, Ken, Kure, Tokuo, Sudo, Yoshimi, Kuroda, Katsuhiro, Todokoro, Hideo
Published in Applied surface science (01.07.1996)
Published in Applied surface science (01.07.1996)
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An objective lens system for e-beam cell projection lithography
Sohda, Yasunari, Saitou, Norio, Itoh, Hiroyuki, Todokoro, Hideo
Published in Microelectronic engineering (1994)
Published in Microelectronic engineering (1994)
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SAMPLE IMAGING METHOD AND CHARGED PARTICLE BEAM SYSTEM
IIZUMI, T, NIMURA, K, SATO, M, OTAKA, T, YAMAGUCHI, S, TODOKORO, H, TAKANE, A
Year of Publication 14.08.2013
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Year of Publication 14.08.2013
Patent
High resolution CD-SEM system
Ose, Y., Ezumi, M., Todokoro, H.
Published in Proceedings Eighth Asian Test Symposium (ATS'99) (1999)
Published in Proceedings Eighth Asian Test Symposium (ATS'99) (1999)
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Conference Proceeding
SAMPLE IMAGING METHOD AND CHARGED PARTICLE BEAM SYSTEM
IIZUMI, T, NIMURA, K, SATO, M, OTAKA, T, YAMAGUCHI, S, TODOKORO, H, TAKANE, A
Year of Publication 26.01.2011
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Year of Publication 26.01.2011
Patent
Thermal characteristics of Si mask for EB cell projection lithography: MicroProcess
NAKAYAMA, Y, SATOH, H, SAITOU, N, HIRASAWA, S, YANAGIDA, T, TODOKORO, H
Published in Japanese journal of applied physics (1992)
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Published in Japanese journal of applied physics (1992)
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