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"TOCHIHARA, YASUTAKA"
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"TOCHIHARA, YASUTAKA"
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MASK BLANK AND PRODUCTION METHOD OF THE SAME, AND MASK
by
KOIKE KESAHIRO
,
TOCHIHARA YASUTAKA
Year of Publication
27.03.2014
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APPARATUS AND METHOD FOR INSPECTING SUBSTRATE SHAPE FOR ELECTRONIC DEVICE, AND MANUFACTURING METHOD OF SUBSTRATE FOR MASK BLANK
by
TOCHIHARA YASUTAKA
Year of Publication
03.04.2008
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METHOD OF PRODUCING MASK BLANK AND METHOD OF PRODUCING TRANSFER MASK
by
KOIKE KESAHIRO
,
TOCHIHARA YASUTAKA
Year of Publication
27.10.2011
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METHOD OF PRODUCING MASK BLANK AND METHOD OF PRODUCING TRANSFER MASK
by
KOIKE KESAHIRO
,
TOCHIHARA YASUTAKA
Year of Publication
06.05.2010
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CLASSIFICATION APPARATUS AND MANUFACTURING METHOD FOR SUBSTRATE FOR ELECTRONIC DEVICE
by
TOCHIHARA YASUTAKA
Year of Publication
24.09.2003
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SUBSTRATE FOR PHOTOMASK BLANK AND METHOD FOR MANUFACTURING THE SUBSTRATE, PHOTOMASK BLANK AND PHOTOMASK
by
KOIKE KESAHIRO
,
TOCHIHARA YASUTAKA
Year of Publication
23.10.2008
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GLASS SUBSTRATE FOR MASK BLANK, MASK BLANK, METHOD FOR PRODUCING GLASS SUBSTRATE FOR MASK BLANK, AND POLISHING DEVICE
by
TOCHIHARA YASUTAKA
,
KOIKE KESAHIRO
Year of Publication
10.11.2005
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SUBSTRATE FOR ELECTRONIC DEVICE AND MANUFACTURING METHOD THEREOF
by
KOIKE KESAHIRO
,
TOCHIHARA YASUTAKA
Year of Publication
13.01.2005
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Verfahren zur Herstellung eines Maskenrohlings, Verfahren zur Herstellung einer Transfermaske
by
TOCHIHARA
,
YASUTAKA
,
OHTSUKA, MASATO
,
KOIKE, KESAHIRO
Year of Publication
02.06.2010
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METHOD FOR DETERMINING FLATNESS OF SUBSTRATE FOR ELECTRONIC DEVICE, PRODUCTION METHOD AND METHOD FOR PRODUCING MASK BLANK AND MASK FOR TRANSFER
by
KOIKE KESAHIRO
,
TOCHIHARA YASUTAKA
Year of Publication
29.01.2004
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WORK POLISHING METHOD, WORK POLISHING SYSTEM, AND SUBSTRATE FOR ELECTRONIC DEVICE
by
KOIKE KESAHIRO
,
TOCHIHARA YASUTAKA
Year of Publication
08.05.2002
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Method of determining a flatness of an electronic device substrate, method of producing the substrate, method of producing a mask blank, method of producing a transfer mask, polishing method, electronic device substrate, mask blank, transfer mask, and polishing apparatus
by
KOIKE KESAHIRO
,
TOCHIHARA YASUTAKA
,
OHTSUKA MASATO
Year of Publication
25.11.2008
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Method of determining a flatness of an electronic device substrate, method of producing the substrate, method of producing a mask blank, method of producing a transfer mask, polishing method, electronic device substrate, mask blank, transfer mask, and polishing apparatus
by
Koike, Kesahiro
,
Ohtsuka, Masato
,
Tochihara
,
Yasutaka
Year of Publication
25.11.2008
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SUBSTRATE FOR PHOTOMASK BLANK AND METHOD FOR MANUFACTURING THE SUBSTRATE, PHOTOMASK BLANK, AND PHOTOMASK
by
KOIKE KESAHIRO
,
TOCHIHARA YASUTAKA
,
MITSUI MASARU
Year of Publication
23.10.2008
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METHOD OF DETERMINING A FLATNESS OF AN ELECTRONIC DEVICE SUBSTRATE, METHOD OF PRODUCING THE SUBSTRATE, METHOD OF PRODUCING A MASK BLANK, METHOD OF PRODUCING A TRANSFER MASK, POLISHING METHOD, ELECTRONIC DEVICE SUBSTRATE, MASK BLANK, TRANSFER MASK, AND POLISHING APPARATUS
by
KOIKE KESAHIRO
,
TOCHIHARA YASUTAKA
,
OHTSUKA MASATO
Year of Publication
24.04.2006
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MANUFACTURING METHOD FOR MASK BLANK SUBSTRATE, MASK BLANK AND TRANSFER MASK
by
KOIKE KESAHIRO
,
TOCHIHARA YASUTAKA
,
OTSUKA MASAHITO
Year of Publication
12.01.2006
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SUBSTRATE FOR MASK BLANK, MASK BLANK, AND MASK FOR TRANSFER
by
KOIKE KESAHIRO
,
TOCHIHARA YASUTAKA
,
OTSUKA MASAHITO
Year of Publication
27.10.2005
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METHOD OF DETERMINING A FLATNESS OF AN ELECTRONIC DEVICE SUBSTRATE, METHOD OF PRODUCING THE SUBSTRATE, METHOD OF PRODUCING A MASK BLANK, METHOD OF PRODUCING A TRANSFER MASK, POLISHING METHOD, ELECTRONIC DEVICE SUBSTRATE, MASK BLANK, TRANSFER MASK, AND POLISHING APPARATUS
by
Koike, Kesahiro
,
Ohtsuka, Masato
,
Tochihara
,
Yasutaka
Year of Publication
04.10.2005
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METHOD OF DETERMINING A FLATNESS OF AN ELECTRONIC DEVICE SUBSTRATE, METHOD OF PRODUCING THE SUBSTRATE, METHOD OF PRODUCING A MASK BLANK, METHOD OF PRODUCING A TRANSFER MASK, POLISHING METHOD, ELECTRONIC DEVICE SUBSTRATE, MASK BLANK, TRANSFER MASK, AND POLISHING APPARATUS
by
KOIKE KESAHIRO
,
TOCHIHARA YASUTAKA
,
OHTSUKA MASATO
Year of Publication
04.10.2005
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Method of determining a flatness of an electronic device substrate, method of producing the substrate, method of producing a mask blank, method of producing a transfer mask, polishing method, electronic device substrate, mask blank, transfer mask, and polishing apparatus
by
KOIKE KESAHIRO
,
TOCHIHARA YASUTAKA
,
OHTSUKA MASATO
Year of Publication
25.08.2005
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