Photo-curable resists for inkjet dispensing applied in large area and high throughput roll-to-roll nanoimprint processes
THESEN, M. W, RUTTLOFF, S, LIMBERG, R. P. F, VOGLER, M, NEES, D, GRÜTZNER, G
Published in Microelectronic engineering (01.07.2014)
Published in Microelectronic engineering (01.07.2014)
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