Nanoscopic Cylindrical Dual Concentric and Lengthwise Block Brush Terpolymers as Covalent Preassembled High-Resolution and High-Sensitivity Negative-Tone Photoresist Materials
Sun, Guorong, Cho, Sangho, Clark, Corrie, Verkhoturov, Stanislav V, Eller, Michael J, Li, Ang, Pavía-Jiménez, Adriana, Schweikert, Emile A, Thackeray, James W, Trefonas, Peter, Wooley, Karen L
Published in Journal of the American Chemical Society (20.03.2013)
Published in Journal of the American Chemical Society (20.03.2013)
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Journal Article
Roughness Power Spectral Density as a Function of Aerial Image and Basic Process / Resist Parameters
Cutler, Charlotte, Lee, Choong-Bong, Thackeray, James W., Trefonas, Peter, Nelson, John, DeSisto, Jason, Li, Mingqi, Rena, Rochelle, Mack, Chris
Published in Journal of Photopolymer Science and Technology (31.01.2020)
Published in Journal of Photopolymer Science and Technology (31.01.2020)
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Journal Article
Utilizing Roughness Power Spectral Density Variables to Guide Resist Formulation and Understand Impact of Frequency Analysis through Process
Cutler, Charlotte, Lee, Choong-Bong, Thackeray, James W., Mack, Chris, Nelson, John, DeSisto, Jason, Li, Mingqi, Aqad, Emad, Hou, Xisen, Marangoni, Tomas, Kaitz, Joshua, Rena, Rochelle
Published in Journal of Photopolymer Science and Technology (15.12.2018)
Published in Journal of Photopolymer Science and Technology (15.12.2018)
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Journal Article
Understanding of Strategic Design of Resist Formulation Through Studying of Quencher-Functional Component and Those Contributions to High Resolution Patterning
Lee, Choong-Bong, Park, James, Cutler, Charlotte, DeSisto, Jason, Rena, Rochelle, Marangoni, Tomas, Aqad, Emad, Thackeray, James W.
Published in Journal of Photopolymer Science and Technology (24.06.2019)
Published in Journal of Photopolymer Science and Technology (24.06.2019)
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Understanding the Role of Acid vs. Electron Blur in EUV Resist Materials
Thackeray, James W., Wagner, Mike, Kang, Su Jun, Biafore, John
Published in Journal of Photopolymer Science and Technology (01.01.2010)
Published in Journal of Photopolymer Science and Technology (01.01.2010)
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Journal Article
Optimization of Polymer-bound PAG (PBP) for 20nm EUV Lithography
Thackeray, James W., Jain, Vipul Jain, Coley, Suzanne, Christianson, Matthew, Arriola, Daniel, LaBeaume, Paul, Kang, Su-Jin, Wagner, Mike, Sung, Jin Wuk, Cameron, Jim
Published in Journal of Photopolymer Science and Technology (01.01.2011)
Published in Journal of Photopolymer Science and Technology (01.01.2011)
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Backbone Degradable Poly(aryl acetal) Photoresist Polymers: Synthesis, Acid Sensitivity, and Extreme Ultraviolet Lithography Performance
Ober, Matthias S, Romer, Duane R, Etienne, John, Thomas, P. J, Jain, Vipul, Cameron, James F, Thackeray, James W
Published in Macromolecules (12.02.2019)
Published in Macromolecules (12.02.2019)
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Advances in Low Diffusion EUV Resists
Thackeray, James W., Cameron, James F., Wagner, Michael, Coley, Suzanne, Labeaume, Vipu Paul, Ongayi, Owndi, Montgomery, Warren, Lovell, Dave, Biafore, John, Chakrapane, Vidhya, Ko, Akiteru
Published in Journal of Photopolymer Science and Technology (01.01.2012)
Published in Journal of Photopolymer Science and Technology (01.01.2012)
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Journal Article
Generation of Powerful Tungsten Reductants by Visible Light Excitation
Sattler, Wesley, Ener, Maraia E, Blakemore, James D, Rachford, Aaron A, LaBeaume, Paul J, Thackeray, James W, Cameron, James F, Winkler, Jay R, Gray, Harry B
Published in Journal of the American Chemical Society (24.07.2013)
Published in Journal of the American Chemical Society (24.07.2013)
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Journal Article
Design Considerations for EUV Resist Materials
Thackeray, James W., Aqad, Emad, Kang, Su Jin, Spear-Alfonso, Kathleen
Published in Journal of Photopolymer Science and Technology (01.01.2009)
Published in Journal of Photopolymer Science and Technology (01.01.2009)
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Journal Article
Directing Self-Assembly of Nanoscopic Cylindrical Diblock Brush Terpolymers into Films with Desired Spatial Orientations: Expansion of Chemical Composition Scope
Cho, Sangho, Yang, Fan, Sun, Guorong, Eller, Michael J., Clark, Corrie, Schweikert, Emile A., Thackeray, James W., Trefonas, Peter, Wooley, Karen L.
Published in Macromolecular rapid communications. (01.02.2014)
Published in Macromolecular rapid communications. (01.02.2014)
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Journal Article
Driving Force Dependence of Electron Transfer from Electronically Excited [Ir(COD)(μ-Me2pz)]2 to Photo-Acid Generators
Sattler, Wesley, Rachford, Aaron A, LaBeaume, Paul J, Coley, Suzanne M, Thackeray, James W, Cameron, James F, Müller, Astrid M, Winkler, Jay R, Gray, Harry B
Published in The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory (12.10.2017)
Published in The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory (12.10.2017)
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Journal Article
Nanodomain analysis with cluster-SIMS: application to the characterization of macromolecular brush architecture
Yang, Fan, Cho, Sangho, Sun, Guorong, Verkhoturov, Stanislav V., Thackeray, James W., Trefonas, Peter, Wooley, Karen L., Schweikert, Emile A.
Published in Surface and interface analysis (01.11.2015)
Published in Surface and interface analysis (01.11.2015)
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Pathway to sub-30nm Resolution in EUV Lithography
Thakerlay, James W., Nassar, Roger A., Spear-Alfonso, Kathleen, Brainard, Robert, Goldfarb, Dario, Wallow, Thomas, Wei, Yayi, Montgomery, Warren, Petrillo, Karen, Wood, Robert, Koay, Chief-seng, Mackey, Jeff, Naulleau, Patrick, Pierson, Bill, Solak, Harun H.
Published in Journal of Photopolymer Science and Technology (01.01.2007)
Published in Journal of Photopolymer Science and Technology (01.01.2007)
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