EUV lithography system and operating method
Schmidt, Stefan-Wolfgang, Te Sligte, Edwin, Ehm, Dirk Heinrich, Osorio, Edgar, Logtenberg, Hella, Zellenrath, Mark
Year of Publication 11.09.2018
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Year of Publication 11.09.2018
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Optical element and optical system for EUV lithography, and method for treating such an optical element
Huijbregtse, Jeroen, Te Sligte, Edwin, Storm, Arnoldus Jan, Graber, Tina, Bekman, Hermanus Hendricus Petrus Theodorus, Ehm, Dirk Heinrich, Ament, Irene, Smeets, Dries, Kuznetsov, Alexey
Year of Publication 23.06.2020
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Year of Publication 23.06.2020
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Verfahren zum Entfernen einer Kontaminationsschicht durch einen Atomlagen-Ätzprozess
Roozeboom, Fred, Becker, Moritz, Ehm, Dirk Heinrich, te Sligte, Edwin, Illiberi, Andrea
Year of Publication 10.01.2019
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Year of Publication 10.01.2019
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Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement therefor
WOLSCHRIJN BASTIAAN THEODOOR, EHM DIRK HEINRICH, STORM ARNOLD, JOSEPHINA MOORS JOHANNES HUBERTUS, STEIN THOMAS, SLIGTE EDWIN TE
Year of Publication 16.04.2013
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Year of Publication 16.04.2013
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Verfahren zum Aufbringen einer Deckschicht und reflektives optisches Element
Sligte, Edwin te, llliberi, Andrea, Roozeboom, Fred, Becker, Moritz, Ehm, Dirk Heinrich
Year of Publication 14.09.2017
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Year of Publication 14.09.2017
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Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement therefor
WOLSCHRIJN BASTIAAN THEODOOR, EHM DIRK HEINRICH, MOORS JOHANNES HUBERTUS JOSEPHINA, STORM ARNOLD, STEIN THOMAS, SLIGTE EDWIN TE
Year of Publication 18.11.2010
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Year of Publication 18.11.2010
Patent
Optische Anordnung für die EUV-Lithographie
BECKER, MORITZ, SCHMIDT, STEFAN-WOLFGANG, SLIGTE, EDWIN TE, EHM, DIRK HEINRICH
Year of Publication 17.09.2015
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Year of Publication 17.09.2015
Patent
EUV UTILIZATION SYSTEM AND METHOD
VAN DE WIEL, Hubertus, TE SLIGTE, Edwin, HARRISON, Kramer, BECKERS, Jasper, VAN DRENT, William
Year of Publication 27.06.2024
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Year of Publication 27.06.2024
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A PELLICLE CLEANING SYSTEM
GRISIN, Ilja, KLEIN, Alexander, TE SLIGTE, Edwin, WOLF, Abraham, VERMEULEN, Paul
Year of Publication 03.08.2023
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Year of Publication 03.08.2023
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Optical surface's contamination removing method for extreme ultraviolet lithography, involves removing contaminations from optical surfaces to form polymerized protective layer, which protects optical surface against metallic compounds
JANSEN, RIK, STORTELDER, JETSKE, WOLSCHRIJN, BASTIAAN THEODOOR, SCHMIDT, STEFAN, SLIGTE, EDWIN TE, MIRVAIS, YOUSEFI, STORM, ARNOLDUS JAN, EHM, DIRK HEINRICH, MOORS, JOHANNES HUBERTUS JOSEPHINA
Year of Publication 26.11.2009
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Year of Publication 26.11.2009
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LITHOGRAPHIC SYSTEM AND METHOD
VAN DRENT, William, Peter, BECKERS, Jasper, Pierre, TE SLIGTE, Edwin, HARRISON, Kramer, Daniel, VAN DE WIEL, Hubertus, Johannes
Year of Publication 26.06.2024
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Year of Publication 26.06.2024
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Reflective optical element for optical system for extreme ultraviolet lithography apparatus, has multilayer system whose substrate side is provided with two layers made from amorphous silicon, silicon nitride, ruthenium and molybdenum
BECKER, MORITZ, KAMPEN, MAARTEN VAN, SCHMIDT, STEFAN-WOLFGANG, VERBERK, ROGIER, SLIGTE, EDWIN TE, STORM, ARNOLDUS JAN, EHM, DIRK HEINRICH, HUIJBREGTSE, JEROEN, BLANCKENHAGEN, GISELA VON
Year of Publication 19.12.2013
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Year of Publication 19.12.2013
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LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGING A TRAJECTORY OF PARTICULATE DEBRIS
BRULS, Richard Joseph, NIKIPELOV, Andrey, HUANG, Yang-Shan, TE SLIGTE, Edwin, DE VRIES, Sjoerd Frans, RAASVELD, Thomas Maarten, ALBRIGHT, Ronald Peter, UZGÖREN, Eray, BAL, Kursat, BANINE, Vadim Yevgenyevich, YAGHOOBI, Parham, MOORS, Johannes Hubertus Josephina, NENCHEV, Georgi Nanchev, JACOBS, Johannes Henricus Wilhelmus, FRIJNS, Olav Waldemar Vladimir, HUANG, Zhuangxiong, UMSTADTER, Karl Robert, VAN DE KERKHOF, Marcus Adrianus, RANJAN, Manish
Year of Publication 02.03.2023
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Year of Publication 02.03.2023
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LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGING A TRAJECTORY OF PARTICULATE DEBRIS
JACOBS, Johannes, Henricus, Wilhelmus, NENCHEV, Georgi, Nenchev, NIKIPELOV, Andrey, HUANG, Yang-Shan, TE SLIGTE, Edwin, UZGÖREN, Eray, BAL, Kursat, YAGHOOBI, Parham, ALBRIGHT, Ronald, Peter, RAASVELD, Thomas, Maarten, DE VRIES, Sjoerd, Frans, HUANG, Zhuangxiong, FRIJNS, Olav, Waldemar, Vladimir, BRULS, Richard, Joseph, UMSTADTER, Karl, Robert, BANINE, Vadim, Yevgenyevich, MOORS, Johannes, Hubertus, Josephina, VAN DE KERKHOF, Marcus, Adrianus, RANJAN, Manish
Year of Publication 30.11.2022
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Year of Publication 30.11.2022
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A pellicle cleaning system
KLEIN, ALEXANDER LUDWIG, VERMEULEN, PAUL ALEXANDER, WOLF, ABRAHAM JAN, GRISIN, ILJA, TE SLIGTE, EDWIN
Year of Publication 01.12.2023
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Year of Publication 01.12.2023
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