METHOD FOR MANUFACTURING A MASK HAVING SUBMILLIMETRIC APERTURES FOR A SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID, MASK HAVING SUBMILLIMETRIC APERTURES, AND SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID
VALENTIN EMMANUEL, TCHAKAROV SVETOSLAV, ZAGDOUN GEORGES, NGHIEM BERNARD
Year of Publication 08.06.2011
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Year of Publication 08.06.2011
Patent