Basic study of quantitative ion scattering spectroscopy I correction factors for quantification
ASAHATA, T, ONOBU, M, KONDO, A, SHIMIZU, R, KANG, H. J
Published in Japanese Journal of Applied Physics (01.12.1997)
Published in Japanese Journal of Applied Physics (01.12.1997)
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Initial stage of preferential sputtering in Cu-Pt alloy studied by sputtered neutrals mass spectrometry
KUNITOMO, S, ASAHATA, T, INOUE, M, SHIMIZU, R
Published in Japanese Journal of Applied Physics (01.10.1994)
Published in Japanese Journal of Applied Physics (01.10.1994)
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A nanofactory by focused ion beam
Fujii, Toshiaki, Iwasaki, Koji, Munekane, Masanao, Takeuchi, Toshitada, Hasuda, Masakatsu, Asahata, Tatsuya, Kiyohara, Masahiro, Kogure, Toshiharu, Kijima, Yukimitsu, Kaito, Takashi
Published in Journal of micromechanics and microengineering (01.10.2005)
Published in Journal of micromechanics and microengineering (01.10.2005)
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