Novel EUV Resist Materials Design for 14 nm Half Pitch and below
Tarutani, Shinji, Tsubaki, Hideaki, Fujimori, Toru, Takizawa, Hiroo, Goto, Takahiro
Published in Journal of Photopolymer Science and Technology (01.01.2014)
Published in Journal of Photopolymer Science and Technology (01.01.2014)
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Journal Article
Characterizing Polymer bound PAG Type EUV Resist
Tarutani, Shinji, Tamaoki, Hiroshi, Tsubaki, Hideaki, Takahashi, Toshiya, Takizawa, Hiroo, Takahashi, Hidenori, Kang, Su-Jin
Published in Journal of Photopolymer Science and Technology (01.01.2011)
Published in Journal of Photopolymer Science and Technology (01.01.2011)
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Journal Article
Negative Tone Imaging Process and Materials for EUV Lithography
Tarutani, Shinji, Nihashi, Wataru, Hirano, Shuuji, Yokokawa, Natsumi, Takizawa, Hiroo
Published in Journal of Photopolymer Science and Technology (01.01.2013)
Published in Journal of Photopolymer Science and Technology (01.01.2013)
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Journal Article
EUV Resist Materials Design for 15 nm Half Pitch and Below
Tsubaki, Hideaki, Tarutani, Shinji, Inoue, Naoki, Takizawa, Hiroo, Goto, Takahiro
Published in Journal of Photopolymer Science and Technology (01.01.2013)
Published in Journal of Photopolymer Science and Technology (01.01.2013)
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Journal Article
EUV Resist Materials for 16 nm And below Half Pitch Applications
Tarutani, Shinji, Tsubaki, Hideaki, Takizawa, Hiroo, Goto, Takahiro
Published in Journal of Photopolymer Science and Technology (01.01.2012)
Published in Journal of Photopolymer Science and Technology (01.01.2012)
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Journal Article
Materials and Processes of Negative Tone Development for Double Patterning Process
Tarutani, Shinji, Tsubaki, Hideaki, Kamimura, Sou
Published in Journal of Photopolymer Science and Technology (01.01.2009)
Published in Journal of Photopolymer Science and Technology (01.01.2009)
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Journal Article
Study on Approaches for Improvement of EUV-resist Sensitivity
Tarutani, Shinji, Tsubaki, Hideaki, Tamaoki, Hiroshi, Takahashi, Hidenori, Itou, Takayuki
Published in Journal of Photopolymer Science and Technology (01.01.2010)
Published in Journal of Photopolymer Science and Technology (01.01.2010)
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Journal Article
Reduction of the Outgassing Segments and LWR Improvement for the Next Generation EUV Lithography
Masuda, Seiya, Tarutani, Shinji, Kamimura, Sou, Hirano, Shuuji, Hoshino, Wataru, Mizutani, Kazuyoshi
Published in Journal of Photopolymer Science and Technology (01.01.2007)
Published in Journal of Photopolymer Science and Technology (01.01.2007)
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Journal Article
Intervalence Electron Transfer in Pentaammineruthenium Complexes of Dipyridylpolyenes, Dipyridylthiophene, and Dipyridylfuran
Ribou, Anne-Cecile, Launay, Jean-Pierre, Takahashi, Kazuko, Nihira, Takayasu, Tarutani, Shinji, Spangler, Charles W
Published in Inorganic chemistry (01.03.1994)
Published in Inorganic chemistry (01.03.1994)
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Journal Article
Materials and Process Parameters on ArF Immersion Defectivity Study
Kanna, Shinichi, Inabe, Haruki, Yamamoto, Kei, Fukuhara, Toshiaki, Tarutani, Shinji, Kanda, Hiromi, Wada, Kenji, Kodama, Kunihiro, Shitabatake, Kenji
Published in Journal of Photopolymer Science and Technology (01.01.2006)
Published in Journal of Photopolymer Science and Technology (01.01.2006)
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Journal Article
Study and Control of the Interfacial Mass Transfer of Resist Components in 193nm Immersion Lithography
Kanna, Shinichi, Inabe, Haruki, Yamamoto, Kei, Tarutani, Shinji, Kanda, Hiromi, Mizutani, Kazuyoshi, Kitada, Kazuyuki, Uno, Shinji, Kawabe, Yasumasa
Published in Journal of Photopolymer Science and Technology (01.01.2005)
Published in Journal of Photopolymer Science and Technology (01.01.2005)
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Journal Article
Advanced RELACS Technology for ArF Resist
Terai, Mamoru, Toyoshima, Toshiyuki, Ishibashi, Takeo, Tarutani, Shinji, Takahashi, Kiyohisa, Takano, Yusuke, Tanaka, Hatsuyuki
Published in Journal of Photopolymer Science and Technology (01.01.2003)
Published in Journal of Photopolymer Science and Technology (01.01.2003)
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Journal Article