METHOD OF CONDITIONING CVD CHAMBER AFTER CLEANING THEREOF
KOLLRACK MICHAEL, FENG GUOFU JEFF, SHANG QUANYUAN, LAW KAM S, ROBERTSON ROBERT, LEE ANGELA, TAKEHARA TAKAKO
Year of Publication 27.06.2003
Get full text
Year of Publication 27.06.2003
Patent
Method of depositing amorphous silicon based films having controlled conductivity
OLSEN, JEFF C, QIU, REGINA, LEGRICE, YVONNE, TAKEHARA, TAKAKO, HARSHBARGER, WILLIAM R
Year of Publication 21.03.2003
Get full text
Year of Publication 21.03.2003
Patent
CONDITIONED CHAMBER FOR IMPROVING CHEMICAL VAPOR DEPOSITION
ANGELA LEE, MIKE KOLLRACK, QUANYUAN SHANG, KAM LAW, TAKAKO TAKEHARA, ROBERT ROBERTSON, JEFF FENG
Year of Publication 18.03.2003
Get full text
Year of Publication 18.03.2003
Patent
REDUCTION OF ELECTROSTATIC CHARGE ON A SUBSTRATE DURING PECVD PROCESS
CHOI, SOO, YOUNG, HARSHBARGER, WILLIAM, R, TAKEHARA, TAKAKO, WON, TAE, KYUNG
Year of Publication 13.03.2003
Get full text
Year of Publication 13.03.2003
Patent
LOW TEMPERATURE PROCESS FOR TFT FABRICATION
KIM, WOONG-KWON, CHANG, YOU-GYUNG, YIM, DONG-KIL, HARSHBARGER, WILLIAM, R, HSIAO, MARK, TAKEHARA, TAKAKO, SHANG, QUANYUAN, YUN, DUKUL
Year of Publication 17.03.2005
Get full text
Year of Publication 17.03.2005
Patent
Reduction of electrostatic charge on a substrate during PECVD process
WON TAE KYUNG, HARSHBARGER WILLIAM R, CHOI SOO YOUNG, TAKEHARA TAKAKO
Year of Publication 13.02.2003
Get full text
Year of Publication 13.02.2003
Patent
PLASMA DISPLAY PANEL WITH A LOW K DIELECTRIC LAYER
MAYDAN, DAN, HARSHBARGER, WILLIAM, R, WON, TAEKYUNG, LAW, KAM, S, TAKEHARA, TAKAKO, SHANG, QUANYUAN
Year of Publication 27.12.2002
Get full text
Year of Publication 27.12.2002
Patent
Plasma display panel with a low k dielectric layer
Law, Kam, Shang, Quanyuan, Takehara, Takako, Won, Taekyung, Harshbarger, William, Maydan, Dan
Year of Publication 19.12.2002
Get full text
Year of Publication 19.12.2002
Patent
Plasma display panel with a low k dielectric layer
WON TAEKYUNG, HARSHBARGER WILLIAM R, MAYDAN DAN, SHANG QUANYUAN, LAW KAM S, TAKEHARA TAKAKO
Year of Publication 19.12.2002
Get full text
Year of Publication 19.12.2002
Patent
Deposition of TEOS oxide using pulsed RF plasma
GOTO HARUHIRO H, HARSHBARGER WILLIAM R, LAW KAM S, SORENSEN CARL A, TAKEHARA TAKAKO
Year of Publication 19.12.2002
Get full text
Year of Publication 19.12.2002
Patent
LOW TEMPERATURE PROCESS FOR TFT FABRICATION
KIM, WOONG-KWON, CHANG, YOU-GYUNG, YIM, DONG-KIL, HARSHBARGER, WILLIAM, R, HSIAO, MARK, TAKEHARA, TAKAKO, SHANG, QUANYUAN, YUN, DUKUL
Year of Publication 23.12.2004
Get full text
Year of Publication 23.12.2004
Patent
Low temperature process for TFT fabrication
Yim, Dong-Kil, Hsiao, Mark, Takehara, Takako, Shang, Quanyuan, Harshbarger, William, Kim, Woong-Kwon, Yun, Duk-Chul, Chang, Youn-Gyung
Year of Publication 02.12.2004
Get full text
Year of Publication 02.12.2004
Patent
Low temperature process for TFT fabrication
YUN DUKUL, CHANG YOUN-GYUNG, HARSHBARGER WILLIAM R, SHANG QUANYUAN, HSIAO MARK, YIM DONG-KIL, KIM WOONG-KWON, TAKEHARA TAKAKO
Year of Publication 02.12.2004
Get full text
Year of Publication 02.12.2004
Patent
Deposition of TEOS oxide using pulsed RF plasma
GOTO HARUHIRO H, HARSHBARGER WILLIAM R, LAW KAM S, SORENSEN CARL A, TAKEHARA TAKAKO
Year of Publication 17.09.2002
Get full text
Year of Publication 17.09.2002
Patent
Deposition of TEOS oxide using pulsed RF plasma
Goto, Haruhiro H, Takehara, Takako, Sorensen, Carl A, Harshbarger, William R, Law, Kam S
Year of Publication 17.09.2002
Get full text
Year of Publication 17.09.2002
Patent
Method of depositing amorphous silicon based films having controlled conductivity
Harshbarger, William, Takehara, Takako, Olsen, Jeff, Qiu, Regina, LeGrice, Yvonne, Feng, Guofu, Robertson, Robert, Law, Kam
Year of Publication 22.08.2002
Get full text
Year of Publication 22.08.2002
Patent
METHODS FOR IMPROVING CHEMICAL VAPOR DEPOSITION PROCESSING
ANGELA LEE, MIKE KOLLRACK, QUANYUAN SHANG, KAM LAW, TAKAKO TAKEHARA, ROBERT ROBERTSON, JEFF FENG
Year of Publication 23.07.2002
Get full text
Year of Publication 23.07.2002
Patent
Annealing an amorphous film using microwave energy
ROBERTSON, ROBERT MCCORMICK, LAW, KAM S, WON, TAEKYUNG, TAKEHARA, TAKAKO, SHANG, QUANYUAN
Year of Publication 11.07.2002
Get full text
Year of Publication 11.07.2002
Patent
GAS REACTIONS TO ELIMINATE CONTAMINATES IN A CVD CHAMBER
ANGELA LEE, MIKE KOLLRACK, QUANYUAN SHANG, KAM LAW, TAKAKO TAKEHARA, ROBERT ROBERTSON, JEFF FENG
Year of Publication 18.06.2002
Get full text
Year of Publication 18.06.2002
Patent