RADIATION-SENSITIVE RESIN COMPOSITION COMPRISING COPOLYMER OF UNSATURATED COMPOUNDS AND QUINONDIAZIDE COMPOUND, INTERLAYER INSULATING FILM AND MICROLENS USING THE SAME, AND METHOD FOR FORMING INTERLAYER INSULATING FILM AND MICROLENS
NISHIKAWA, MICHINORI, SANO, KIMIYASU, TAKAMOTO, EIJI, HAMADA, KEN ICHI, MINOWA, TAKAKI
Year of Publication 21.02.2005
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Year of Publication 21.02.2005
Patent