Fabrication of 10-nm Si pillars with self-formed etching masks
Tada, Tetsuya, Kanayama, Toshihiko, Weibel, Pascal, Carroll, Simon J., Seeger, Katrin, Palmer, Richard E.
Published in Microelectronic engineering (01.02.1997)
Published in Microelectronic engineering (01.02.1997)
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