Reducing photoresist layer degradation in plasma immersion ion implantation
Hilkene, Martin A, Santhanam, Kartik, Ta, Yen B, Porshnev, Peter I, Foad, Majeed A
Year of Publication 28.06.2011
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Year of Publication 28.06.2011
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Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking
Vellaikal, Manoj, Santhanam, Kartik, Ta, Yen B, Hilkene, Martin A, Scotney-Castle, Matthew D, Lai, Canfeng, Porshnev, Peter I, Foad, Majeed A
Year of Publication 23.08.2011
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Year of Publication 23.08.2011
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Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking
Vellaikal, Manoj, Santhanam, Kartik, Ta, Yen B, Hilkene, Martin A, Scotney-Castle, Matthew D, Lai, Canfeng, Porshnev, Peter I, Foad, Majeed A
Year of Publication 09.02.2010
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Year of Publication 09.02.2010
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Methods to adjust threshold voltage in semiconductor devices
WARD MICHAEL G, CHIANG SUNNY, SRINIVASAN SWAMINATHAN, TA YEN B, PORSHNEV PETER I, PEIDOUS IGOR V, DARLAK ANDREW
Year of Publication 12.08.2014
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Year of Publication 12.08.2014
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SURFACE DOSE RETENTION OF DOPANTS BY PRE-AMORPHIZATION AND POST IMPLANT PASSIVATION TREATMENTS
VELLAIKAL MANOJ, SCOTNEY-CASTLE MATTHEW D, SANTHANAM KARTIK, TA YEN B, PORSHNEV PETER I
Year of Publication 15.11.2012
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Year of Publication 15.11.2012
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REDUCING PHOTORESIST LAYER DEGRADATION IN PLASMA IMMERSION ION IMPLANTATION
TA, YEN, B, FOAD, MAJEED, A, HILKENE, MARTIN, A, PORSHNEV, PETER, I, SANTHANAM, KARTIK
Year of Publication 29.08.2011
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Year of Publication 29.08.2011
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Reducing photoresist layer degradation in plasma immersion ion implantation
HILKENE MARTIN A, SANTHANAM KARTIK, FOAD MAJEED A, TA YEN B, PORSHNEV PETER I
Year of Publication 28.06.2011
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Year of Publication 28.06.2011
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METHODS TO ADJUST THRESHOLD VOLTAGE IN SEMICONDUCTOR DEVICES
WARD MICHAEL G, CHIANG SUNNY, SRINIVASAN SWAMINATHAN, TA YEN B, PORSHNEV PETER I, PEIDOUS IGOR V, DARLAK ANDREW
Year of Publication 05.07.2012
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Year of Publication 05.07.2012
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REDUCING PHOTORESIST LAYER DEGRADATION IN PLASMA IMMERSION ION IMPLANTATION
TA, YEN, B, FOAD, MAJEED, A, HILKENE, MARTIN, A, PORSHNEV, PETER, I, SANTHANAM, KARTIK
Year of Publication 29.12.2010
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Year of Publication 29.12.2010
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HIGH THROUGHPUT SELECTIVE OXIDATION OF SILICON AND POLYSILICON USING PLASMA AT ROOM TEMPERATURE
SCOTNEY-CASTLE MATTHEW, BRITT MARLA, RAMAMURTHY SUNDAR, TA YEN B, FOAD MAJEED
Year of Publication 25.11.2010
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Year of Publication 25.11.2010
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REDUCING PHOTORESIST LAYER DEGRADATION IN PLASMA IMMERSION ION IMPLANTATION
TA, YEN, B, FOAD, MAJEED, A, HILKENE, MARTIN, A, PORSHNEV, PETER, I, SANTHANAM, KARTIK
Year of Publication 29.07.2010
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Year of Publication 29.07.2010
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REDUCING PHOTORESIST LAYER DEGRADATION IN PLASMA IMMERSION ION IMPLANTATION
HILKENE MARTIN A, SANTHANAM KARTIK, FOAD MAJEED A, TA YEN B, PORSHNEV PETER I
Year of Publication 29.07.2010
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Year of Publication 29.07.2010
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PRE OR POST-IMPLANT PLASMA TREATMENT FOR PLASMA IMMERSED ION IMPLANTATION PROCESS
VELLAIKAL MANOJ, SCOTNEY-CASTLE MATTHEW D, HILKENE MARTIN A, SANTHANAM KARTIK, FOAD MAJEED A, TA YEN B, PORSHNEV PETER I
Year of Publication 29.11.2012
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Year of Publication 29.11.2012
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Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking
VELLAIKAL MANOJ, SCOTNEY-CASTLE MATTHEW D, HILKENE MARTIN A, SANTHANAM KARTIK, FOAD MAJEED A, TA YEN B, LAI CANFENG, PORSHNEV PETER I
Year of Publication 23.08.2011
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Year of Publication 23.08.2011
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Methods to adjust threshold voltage in semiconductor devices
TA, YEN B, PEIDOUS, IGOR V, PORSHNEV, PETER I, DARLAK, ANDREW, SRINIVASAN, SWAMINATHAN, WARD, MICHAEL G, CHIANG, SUNNY
Year of Publication 11.06.2016
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Year of Publication 11.06.2016
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Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking
VELLAIKAL MANOJ, SCOTNEY-CASTLE MATTHEW D, HILKENE MARTIN A, SANTHANAM KARTIK, FOAD MAJEED A, TA YEN B, LAI CANFENG, PORSHNEV PETER I
Year of Publication 09.02.2010
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Year of Publication 09.02.2010
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PLASMA IMMERSION ION IMPLANTATION PROCESS WITH CHAMBER SEASONING AND SEASONING LAYER PLASMA DISCHARGING FOR WAFER DECHUCKING
VELLAIKAL MANOJ, SCOTNEY-CASTLE MATTHEW D, HILKENE MARTIN A, SANTHANAM KARTIK, FOAD MAJEED A, TA YEN B, LAI CANFENG, PORSHNEV PETER I
Year of Publication 12.11.2009
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Year of Publication 12.11.2009
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PLASMA IMMERSION ION IMPLANTATION PROCESS WITH CHAMBER SEASONING AND SEASONING LAYER PLASMA DISCHARGING FOR WAFER DECHUCKING
VELLAIKAL, MANOJ, TA, YEN, B, FOAD, MAJEED, A, HILKENE, MARTIN, A, SCOTNEY-CASTLE, MATTHEW, D, PORSHNEV, PETER, I, SANTHANAM, KARTIK, LAI, CANFENG
Year of Publication 03.09.2009
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Year of Publication 03.09.2009
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