A novel 0.5- mu m n/sup +/-p/sup +/ poly-gated salicide CMOS process
Pfiester, J.R., Yeargain, J.R., Swenson, M.S., Alvis, J.R.
Published in IEEE transactions on electron devices (01.11.1989)
Published in IEEE transactions on electron devices (01.11.1989)
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Journal Article
A 0.6 /spl mu/m CMOS pinned photodiode color imager technology
Guidash, R.M., Lee, T.-H., Lee, P.P.K., Sackett, D.H., Drowley, C.I., Swenson, M.S., Arbaugh, L., Hollstein, R., Shapiro, F., Domer, S.
Published in International Electron Devices Meeting. IEDM Technical Digest (1997)
Published in International Electron Devices Meeting. IEDM Technical Digest (1997)
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Conference Proceeding