High-reflection Mo/Be/Si multilayers for EUV lithography
Chkhalo, Nikolai I, Gusev, Sergei A, Nechay, Andrey N, Pariev, Dmitry E, Polkovnikov, Vladimir N, Salashchenko, Nikolai N, Schäfers, Franz, Sertsu, Mewael G, Sokolov, Andrey, Svechnikov, Mikhail V, Tatarsky, Dmitry A
Published in Optics letters (15.12.2017)
Published in Optics letters (15.12.2017)
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Stable high-reflection Be/Mg multilayer mirrors for solar astronomy at 30.4 nm
Polkovnikov, Vladimir N, Chkhalo, Nikolai I, Pleshkov, Roman S, Salashchenko, Nikolai N, Schäfers, Franz, Sertsu, Mewael G, Sokolov, Andrey, Svechnikov, Mikhail V, Zuev, Sergei Yu
Published in Optics letters (15.01.2019)
Published in Optics letters (15.01.2019)
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