One-shot stereolithography for biomimetic micro hemisphere covered with relief structure
Suzuki, Yuki, Suzuki, Kunikazu, Michihata, Masaki, Takamasu, Kiyoshi, Takahashi, Satoru
Published in Precision engineering (01.10.2018)
Published in Precision engineering (01.10.2018)
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Journal Article
Correction: Flexible Evanescent Wave Interference Lithography System for Sub-half-Wavelength Complex Relief Structures Fabrication
Torii, Yuki, Masui, Shuzo, Matsumoto, Yuki, Suzuki, Kunikazu, Michihata, Masaki, Takamasu, Kiyoshi, Takahashi, Satoru
Published in Nanomanufacturing and metrology (01.12.2022)
Published in Nanomanufacturing and metrology (01.12.2022)
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Journal Article
Flexible Evanescent Wave Interference Lithography System for Sub-half-Wavelength Complex Relief Structures Fabrication
Torii, Yuki, Masui, Shuzo, Matsumoto, Yuki, Suzuki, Kunikazu, Michihata, Masaki, Takamasu, Kiyoshi, Takahashi, Satoru
Published in Nanomanufacturing and metrology (01.12.2021)
Published in Nanomanufacturing and metrology (01.12.2021)
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Journal Article
IMAGE PROJECTION SYSTEM, IMAGE PROCESSING APPARATUS, AND GAME MACHINE
SUZUKI KUNIKAZU, FUNAISHI YOSHIKI, NAKAJIMA TAKUYA, OTAKE SUSUMU, HIRANO DAISUKE
Year of Publication 15.11.2018
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Year of Publication 15.11.2018
Patent
MANUFACTURING METHOD AND MANUFACTURING DEVICE OF OVERHANG STRUCTURE
TANAKA HIRONAO, SUZUKI KUNIKAZU, TAKAHASHI SATORU, MICHIHATA MASAKI, SUZUKI YUKI
Year of Publication 07.09.2017
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Year of Publication 07.09.2017
Patent