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"Surisetty, C. V. V. S."
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"Surisetty, C. V. V. S."
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Electrochemical investigation of the roles of oxyanions in chemical–mechanical planarization of tantalum and tantalum nitride
by
Sulyma, C. M.
,
Pettit, C. M.
,
Surisetty
,
C
.
V
.
V
.
S
.
,
Babu, S. V.
,
Roy, D.
Published in
Journal of applied electrochemistry
(01.05.2011)
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Dissolution Inhibition in Cu-CMP Using Dodecyl-Benzene-Sulfonic Acid Surfactant with Oxalic Acid and Glycine as Complexing Agents
by
Surisetty
,
C
.
V
.
V
.
S
.
,
Goonetilleke, P. C.
,
Roy, D.
,
Babu, S. V.
Published in
Journal of the Electrochemical Society
(2008)
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Utility of Oxy-Anions for Selective Low Pressure Polishing of Cu and Ta in Chemical Mechanical Planarization
by
Surisetty
,
C
.
V
.
V
.
S
.
,
Peethala, B. C.
,
Roy, D.
,
Babu, S. V.
Published in
Electrochemical and solid-state letters
(2010)
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Oxalic-Acid-Based Slurries with Tunable Selectivity for Copper and Tantalum Removal in CMP
by
Janjam, S. V. S. B.
,
Surisetty
,
C
.
V
.
V
.
S
.
,
Pandija, S.
,
Roy, D.
,
Babu, S. V.
Published in
Electrochemical and solid-state letters
(2008)
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