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Published in Scientific reports (20.06.2022)
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Published in Nanotechnology (08.01.2022)
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Synthesis of vertically aligned wafer-scale tantalum disulfide using high-Ar/H 2 S ratio plasma
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Published in Nanotechnology (08.01.2022)
Published in Nanotechnology (08.01.2022)
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method for manufacturing semiconductor device
SHIM SEUNGBO, KIM YONGHEE, SUNG DOUGYONG, LEE SEOKGEUN, CHOI MYUNGSUN, LEE MINJAE
Year of Publication 01.12.2020
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Year of Publication 01.12.2020
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plasma etching method and manufacturing method of semiconductor device including the same
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Year of Publication 13.04.2021
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Apparatus and Method for Plasma treating and method of fabricating semiconductor using the same
SUN JONGWOO, KIM KYOHYEOK, SUNG DOUGYONG, LEE SUNG KI, LEE JAEHYUN, OH SEJIN
Year of Publication 01.06.2020
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Year of Publication 01.06.2020
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PLASMA PROCESSING APPARATUS
SUNG, Dougyong, KIM, Namkyun, KIM, Minsung, NOH, Youngjin, KIM, Yunhwan
Year of Publication 14.12.2023
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Year of Publication 14.12.2023
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SUBSTRATE PROCESSING APPARATUS INCLUDING PLURALITY OF ELECTRODES
SUNG, Dougyong, KIM, Namkyun, NOH, Youngjin, KIM, Yunhwan, KIM, Byeongsang
Year of Publication 30.03.2023
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Year of Publication 30.03.2023
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