Clean SiO2 atomic layer etching based on physisorption of high boiling point perfluorocarbon
Dain Sung, Tak, Hyunwoo, Kim, Heeju, Kim, Dongwoo, Kim, Kyongnam, Yeom, Geunyoung
Published in Nanoscale (07.08.2024)
Published in Nanoscale (07.08.2024)
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Journal Article
Clean SiO 2 atomic layer etching based on physisorption of high boiling point perfluorocarbon
Sung, Dain, Tak, Hyunwoo, Kim, Heeju, Kim, Dongwoo, Kim, Kyongnam, Yeom, Geunyoung
Published in Nanoscale (07.08.2024)
Published in Nanoscale (07.08.2024)
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Journal Article
Effect of hydrofluorocarbon structure of C3H2F6 isomers on high aspect ratio etching of silicon oxide
Tak, Hyun Woo, Lee, Hye Joo, Wen, Long, Kang, Byung Jin, Sung, Dain, Bae, Jeong Woon, Kim, Dong Woo, Lee, Wonseok, Lee, Seung Bae, Kim, Keunsuk, Cho, Byeong Ok, Kim, Young Lea, Song, Han Dock, Yeom, Geun Young
Published in Applied surface science (30.10.2022)
Published in Applied surface science (30.10.2022)
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Journal Article
Characteristics of high aspect ratio SiO2 etching using C4H2F6 isomers
Lee, Hye Joo, Tak, Hyun Woo, Kim, Seong Bae, Kim, Seul Ki, Park, Tae Hyun, Kim, Ji Yeun, Sung, Dain, Lee, Wonseok, Lee, Seung Bae, Kim, Keunsuk, Cho, Byeong Ok, Kim, Young Lea, Lee, Ki Chan, Kim, Dong Woo, Yeom, Geun Young
Published in Applied surface science (01.12.2023)
Published in Applied surface science (01.12.2023)
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Journal Article
PLASMA PRESS APPARATUS AND BONDING METHOD USING SAME
MUN, Mu Kyeom, YEOM, Won Kyun, PARK, Jinwoo, YEOM, Geunyoung, PARK, Sung Woo, SUNG, Dain, KIM, Ki Hyun, KIM, Doo San
Year of Publication 09.11.2017
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Year of Publication 09.11.2017
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