Plasma-Assisted Dry Etching of Ferroelectric Capacitor Modules and Application to a 32M Ferroelectric Random Access Memory Devices with Submicron Feature Sizes
Lee, Sang-Woo, Joo, Suk-Ho, Cho, Sung Lae, Son, Yoon-Ho, Lee, Kyu-Mann, Nam, Sang-Don, Park, Kun-Sang, Lee, Yong-Tak, Seo, Jung-Suk, Kim, Young-Dae, An, Hyeong-Geun, Kim, Hyoung-Joon, Jung, Yong-Ju, Heo, Jang-Eun, Lee, Moon-Sook, Park, Soon-Oh, Chung, U-In, Moon, Joo-Tae
Published in Japanese Journal of Applied Physics (01.01.2002)
Published in Japanese Journal of Applied Physics (01.01.2002)
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Journal Article
Electrical properties of sputtered (Ba, Sr)TiO3 thin films prepared by two-step deposition method
BYOUNG TAEK LEE, WAN DON KIM, MOON YONG LEE, KI HOON LEE, HAN JIN LIM, CHANG SEOK KANG, HIDEKI, H, SUK HO JOO, HONG BAE PARK, CHA YOUNG YOO, SANG IN LEE
Published in Journal of electronic materials (01.04.1999)
Published in Journal of electronic materials (01.04.1999)
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Journal Article
Highly Stable Etch Stopper Technology for 0.25 µm 1 Transistor 1 Capacitor (1T1C) 32 Mega-Bit Ferroelectric Random Access Memory (FRAM)
Jang, Nak-Won, Song, Yoon-Jong, Joo, Suk-Ho, Lee, Kyu-Mann, Kim, Hyun-Ho, Joo, Heung-Jin, Park, Jung-Hoon, Lee, Sang-Woo, Lee, Sung-Yung, Kim, Kinam
Published in Japanese Journal of Applied Physics (30.04.2003)
Published in Japanese Journal of Applied Physics (30.04.2003)
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Journal Article
Novel capacitor process using diffusion barrier rounded by Si3N4 spacer for high density FRAM device
Bon Jae Koo, Yoon Jong Song, Sung Yung Lee, Dong Jin Jung, Hyun Ho Kim, Suk Ho Joo, Yong Tak Lee, Kinam Kim
Published in IEEE electron device letters (01.06.2000)
Published in IEEE electron device letters (01.06.2000)
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Journal Article
Novel capacitor process using diffusion barrier rounded by Si sub(3)N sub(4) spacer for high density FRAM device
Koo, Bon Jae, Song, Yoon Jong, Lee, Sung Yung, Jung, Dong Jin, Kim, Hyun Ho, Joo, Suk Ho, Lee, Yong Tak, Kim, Kinam
Published in IEEE electron device letters (01.01.2000)
Published in IEEE electron device letters (01.01.2000)
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Journal Article
Highly Reliable 0.15 µm/14 F 2 Cell Ferroelectric Random Access Memory Capacitor Using SrRuO 3 Buffer Layer
Heo, Jang-Eun, Bae, Byoung-Jae, Yoo, Dong-Chul, Nam, Sang-Don, Lim, Ji-Eun, Im, Dong-Hyun, Joo, Suk-Ho, Jung, Yong-Ju, Choi, Suk-Hun, Park, Soon-Oh, Kim, Hee-Seok, Chung, U-In, Moon, Joo-Tae
Published in Japanese Journal of Applied Physics (01.04.2006)
Published in Japanese Journal of Applied Physics (01.04.2006)
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Journal Article
Novel capacitor process using diffusion barrier rounded by Si/sub 3/N/sub 4/ spacer for high density FRAM device
Bon Jae Koo, Yoon Jong Song, Sung Yung Lee, Dong Jin Jung, Hyun Ho Kim, Suk Ho Joo, Yong Tak Lee, Kinam Kim
Published in IEEE electron device letters (01.06.2000)
Published in IEEE electron device letters (01.06.2000)
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Journal Article
Novel capacitor process using diffusion barrier rounded by Si3 N4 spacer for high density FRAM device
Koo, Bon Jae, Song, Yoon Jong, Lee, Sung Yung, Jung, Dong Jin, Kim, Hyun Ho, Joo, Suk Ho, Lee, Yong Tak, Kim, Kinam
Published in IEEE electron device letters (01.06.2000)
Published in IEEE electron device letters (01.06.2000)
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Journal Article
Novel capacitor process using diffusion barrier rounded by Si(3)N(4) spacer for high density FRAM device
Koo, Bon Jae, Song, Yoon Jong, Lee, Sung Yung, Jung, Dong Jin, Kim, Hyun Ho, Joo, Suk Ho, Lee, Yong Tak, Kim, Kinam
Published in IEEE electron device letters (01.06.2000)
Published in IEEE electron device letters (01.06.2000)
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Journal Article
Enhanced Retention Characteristics of Pb(Zr, Ti)O 3 Capacitors by Ozone Treatment
Lee, Kyu-Mann, An, Hyeong-Geun, Lee, June-Key, Lee, Yong-Tak, Lee, Sang-Woo, Joo, Suk-Ho, Nam, Sang-Don, Park, Kun-Sang, Lee, Moon-Sook, Park, Soon-Oh, Kang, Ho-Kyu, Moon, Joo-Tae
Published in Japanese Journal of Applied Physics (01.08.2001)
Published in Japanese Journal of Applied Physics (01.08.2001)
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Journal Article
Integration of Ferroelectric Random Access Memory Devices with Ir/IrO 2 /Pb(Zr x Ti 1- x )\barO 3 /Ir Capacitors Formed by Metalorganic Chemical Vapor Deposition-Grown Pb(Zr x Ti 1- x )O 3
Lee, Moon-Sook, Park, Kun-Sang, Nam, Sang-Don, Lee, Kyu-Mann, Seo, Jung-Suk, Joo, Suk-Ho, Lee, Sang-Woo, Lee, Yong-Tak, An, Hyeong-Geun, Kim, Hyoung-Joon, Cho, Sung-Lae, Son, Yoon-Ho, Kim, Young-Dae, Jung, Yong-Joo, Heo, Jang-Eun, Park, Soon-Oh, Chung, U-In, Moon, Joo-Tae
Published in Japanese Journal of Applied Physics (30.11.2002)
Published in Japanese Journal of Applied Physics (30.11.2002)
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Journal Article
HIGHLY STABLE ETCH STOPPER TECHNOLOGY FOR 0.25 MU M 1 TRANSISTOR 1 CAPACITOR (1T1C) 32 MEGA-BIT FERROELECTRIC RANDOM ACCESS MEMORY (FRAM)
Jang, N-W, Song, Y-J, Joo, S-H, Lee, K-M, Kim, H-H, Joo, H-J, Park, J-H
Published in Japanese Journal of Applied Physics, Part 1 (2003)
Published in Japanese Journal of Applied Physics, Part 1 (2003)
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Journal Article
Electrical properties of sputtered (Ba, Sr)TiO sub(3) thin films prepared by two-step deposition method
Lee, Byoung Taek, Kim, Wan Don, Lee, Ki Hoon, Lim, Han Jin, Kang, Chang Seok, Hideki, Horii, Joo, Suk Ho, Park, Hong Bae, Yoo, Cha Young, Lee, Sang In, Lee, Moon Yong
Published in Journal of electronic materials (01.04.1999)
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Published in Journal of electronic materials (01.04.1999)
Journal Article