High-Aspect-Ratio Parallel-Plate Microchannels Applicable to Kinetic Analysis of Chemical Vapor Deposition
Shima, Kohei, Funato, Yuichi, Sugiura, Hidetoshi, Sato, Noboru, Fukushima, Yasuyuki, Momose, Takeshi, Shimogaki, Yukihiro
Published in Advanced materials interfaces (01.08.2016)
Published in Advanced materials interfaces (01.08.2016)
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Journal Article
Elementary gas‐phase reactions of radical species during chemical vapor deposition of silicon carbide using CH3SiCl3
Sato, Noboru, Funato, Yuichi, Shima, Kohei, Sugiura, Hidetoshi, Fukushima, Yasuyuki, Momose, Takeshi, Koshi, Mitsuo, Shimogaki, Yukihiro
Published in International journal of chemical kinetics (01.05.2021)
Published in International journal of chemical kinetics (01.05.2021)
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Journal Article
Elementary gas‐phase reactions of radical species during chemical vapor deposition of silicon carbide using CH 3 SiCl 3
Sato, Noboru, Funato, Yuichi, Shima, Kohei, Sugiura, Hidetoshi, Fukushima, Yasuyuki, Momose, Takeshi, Koshi, Mitsuo, Shimogaki, Yukihiro
Published in International journal of chemical kinetics (01.05.2021)
Published in International journal of chemical kinetics (01.05.2021)
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Journal Article
Fundamental Evaluation of Gas-Phase Elementary Reaction Models for Silicon Carbide Chemical Vapor Deposition
Funato, Yuichi, Sato, Noboru, Fukushima, Yasuyuki, Sugiura, Hidetoshi, Momose, Takeshi, Shimogaki, Yukihiro
Published in ECS journal of solid state science and technology (01.01.2017)
Published in ECS journal of solid state science and technology (01.01.2017)
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Journal Article
Microchannels: High-Aspect-Ratio Parallel-Plate Microchannels Applicable to Kinetic Analysis of Chemical Vapor Deposition (Adv. Mater. Interfaces 16/2016)
Shima, Kohei, Funato, Yuichi, Sugiura, Hidetoshi, Sato, Noboru, Fukushima, Yasuyuki, Momose, Takeshi, Shimogaki, Yukihiro
Published in Advanced materials interfaces (19.08.2016)
Published in Advanced materials interfaces (19.08.2016)
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Journal Article
PLANARIZATION METHOD FOR SUBSTRATE
SUGIURA HIDETOSHI, KUMAGAI KAZUTO, UMEZAKI TOMONORI, TANIGUCHI YUYA, KUBOTA YOSHINORI
Year of Publication 14.09.2017
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Year of Publication 14.09.2017
Patent
Multi-Scale Analysis and Elementary Reaction Simulation of SiC-CVD Using CH3SiCl3/H2: I. Effect of Reaction Temperature
Fukushima, Yasuyuki, Sato, Noboru, Funato, Yuichi, Sugiura, Hidetoshi, Hotozuka, Kozue, Momose, Takeshi, Shimogaki, Yukihiro
Published in ECS journal of solid state science and technology (01.01.2013)
Published in ECS journal of solid state science and technology (01.01.2013)
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Journal Article
Multi-Scale Analysis and Elementary Reaction Simulation of SiC-CVD Using CH 3 SiCl 3 /H 2: I. Effect of Reaction Temperature
Fukushima, Yasuyuki, Sato, Noboru, Funato, Yuichi, Sugiura, Hidetoshi, Hotozuka, Kozue, Momose, Takeshi, Shimogaki, Yukihiro
Published in ECS journal of solid state science and technology (2013)
Published in ECS journal of solid state science and technology (2013)
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Journal Article
METHOD AND APPARATUS FOR MANUFACTURING HEAT-RESISTANT COMPOSITE MATERIAL
SHIMA KOHEI, FUKUSHIMA YASUYUKI, SUGIURA HIDETOSHI, FUNAKADO YUICHI, NAKAMURA TAKESHI, MOMOSE TAKESHI, SHIMOGAKI YUKIHIRO, HODOZUKA KOZUE
Year of Publication 24.08.2015
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Year of Publication 24.08.2015
Patent
METHOD FOR MANUFACTURING HEAT RESISTANT COMPOSITE MATERIAL AND MANUFACTURING DEVICE
FUNATO, YUICHI, SHIMOGAKI, YUKIHIRO, FUCHIGAMI, KENJI, MOMOSE, TAKESHI, HOTOZUKA, KOZUE, NAKAMURA, TAKESHI, FUKUSHIMA, YASUYUKI, SATO, NOBORU, ISHIZAKI, MASATO, SUGIURA, HIDETOSHI
Year of Publication 20.02.2014
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Year of Publication 20.02.2014
Patent
METHOD FOR PRODUCING HEAT-RESISTANT COMPOSITE MATERIAL
SUGIURA, Hidetoshi, FUKUSHIMA, Yasuyuki, SHIMA, Kohei, HOTOZUKA, Kozue, SHIMOGAKI, Yukihiro, FUNATO, Yuichi, MOMOSE, Takeshi, NAKAMURA, Takeshi
Year of Publication 26.07.2023
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Year of Publication 26.07.2023
Patent