Comparison of DC and AC NBTI kinetics in RMG Si and SiGe p-FinFETs
Parihar, Narendra, Southwick, Richard G., Sharma, Uma, Miaomiao Wang, Stathis, James H., Mahapatra, Souvik
Published in 2017 IEEE International Reliability Physics Symposium (IRPS) (01.04.2017)
Published in 2017 IEEE International Reliability Physics Symposium (IRPS) (01.04.2017)
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Conference Proceeding
Bias Temperature Instability Reliability in Stacked Gate-All-Around Nanosheet Transistor
Wang, Miaomiao, Zhang, Jingyun, Zhou, Huimei, Southwick, Richard G., Kuo Chao, Robin Hsin, Miao, Xin, Basker, Veeraraghavan S., Yamashita, Tenko, Guo, Dechao, Karve, Gauri, Bu, Huiming, Stathis, James H.
Published in 2019 IEEE International Reliability Physics Symposium (IRPS) (01.03.2019)
Published in 2019 IEEE International Reliability Physics Symposium (IRPS) (01.03.2019)
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Conference Proceeding
Hot carrier reliability in ultra-scaled sige channel p-FinFETs
Miaomiao Wang, Xin Miao, Stathis, James H., Southwick, Richard
Published in 2017 IEEE 12th International Conference on ASIC (ASICON) (01.10.2017)
Published in 2017 IEEE 12th International Conference on ASIC (ASICON) (01.10.2017)
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Conference Proceeding
Separation of interface states and electron trapping for hot carrier degradation in ultra-scaled replacement metal gate n-FinFET
Miaomiao Wang, Zuoguang Liu, Yamashita, Tenko, Stathis, James H., Chia-yu Chen
Published in 2015 IEEE International Reliability Physics Symposium (01.04.2015)
Published in 2015 IEEE International Reliability Physics Symposium (01.04.2015)
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Conference Proceeding
Spatial mapping of non-uniform time-to-breakdown and physical evidence of defect clustering
Wu, Ernest Y., Baozhen Li, Stathis, James H., Linder, Barry, Shaw, Thomas
Published in 2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers (01.06.2014)
Published in 2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers (01.06.2014)
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Conference Proceeding
Voltage dependence of hard breakdown growth and the reliability implication in thin dielectrics
Linder, B.P., Lombardo, S., Stathis, J.H., Vayshenker, A., Frank, D.J.
Published in IEEE electron device letters (01.11.2002)
Published in IEEE electron device letters (01.11.2002)
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Journal Article
The Dielectric Breakdown in Gate Oxides under High Field Stress
Lombardo, Salvatore A., Stathis, James H., Bersuker, Gennadi
Published in ECS transactions (01.01.2009)
Published in ECS transactions (01.01.2009)
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Journal Article
The effect of interface thickness of high-k/metal gate stacks on NFET dielectric reliability
Linder, B.P., Cartier, E., Krishnan, S., Stathis, J.H., Kerber, A.
Published in 2009 IEEE International Reliability Physics Symposium (01.04.2009)
Published in 2009 IEEE International Reliability Physics Symposium (01.04.2009)
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Conference Proceeding
Impact of ultra thin oxide breakdown on circuits
Stathis, J.H.
Published in 2005 International Conference on Integrated Circuit Design and Technology, 2005. ICICDT 2005 (2005)
Published in 2005 International Conference on Integrated Circuit Design and Technology, 2005. ICICDT 2005 (2005)
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Conference Proceeding
Hot carrier effect in ultra-scaled replacement metal gate Sii-xGex channel p-FinFETs
Miaomiao Wang, Xin Miao, Stathis, James H., Southwick, Richard, Linder, Barry P., Liu, Derrick, Ruqiang Bao, Watanabe, Koji
Published in 2016 IEEE International Electron Devices Meeting (IEDM) (01.12.2016)
Published in 2016 IEEE International Electron Devices Meeting (IEDM) (01.12.2016)
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Conference Proceeding
Multiple breakdown phenomena and modeling for non-uniform dielectric systems
Wu, Ernest, Baozhen Li, Stathis, James H., Achanta, Ravi
Published in 2014 IEEE International Electron Devices Meeting (01.12.2014)
Published in 2014 IEEE International Electron Devices Meeting (01.12.2014)
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Conference Proceeding
Accelerated wafer testing using non-destructive and localized stress
Clevenger, Lawrence A, Lanzillo, Nicholas A, Rizzolo, Michael, Standaert, Theodorus E, Briggs, Benjamin D, Stathis, James H
Year of Publication 11.08.2020
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Year of Publication 11.08.2020
Patent
ACCELERATED WAFER TESTING USING NON-DESTRUCTIVE AND LOCALIZED STRESS
Clevenger, Lawrence A, Lanzillo, Nicholas A, Rizzolo, Michael, Standaert, Theodorus E, Briggs, Benjamin D, Stathis, James H
Year of Publication 15.11.2018
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Year of Publication 15.11.2018
Patent
ACCELERATED WAFER TESTING USING NON-DESTRUCTIVE AND LOCALIZED STRESS
Clevenger, Lawrence A, Lanzillo, Nicholas A, Rizzolo, Michael, Standaert, Theodorus E, Briggs, Benjamin D, Stathis, James H
Year of Publication 15.11.2018
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Year of Publication 15.11.2018
Patent