13nm gate Intentional Defect Array (IDA) wafer patterning by e-beam lithography for defect metrology evaluation
Raghunathan, Ananthan, Bennett, Steve, Stamper, Harlem O., Hartley, John G., Arceo, Abraham, Johnson, Mark, Deeb, Chris, Patel, Dilip, Nadeau, Jim
Published in Microelectronic engineering (01.08.2011)
Published in Microelectronic engineering (01.08.2011)
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