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Published in Journal of the Electrochemical Society (2005)
Published in Journal of the Electrochemical Society (2005)
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Erratum: ALD of Hafnium Oxide Thin Films from Tetrakis(ethylmethylamino)hafnium and Ozone [J. Electrochem. Soc., 152, G213 (2005)]
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Published in Journal of the Electrochemical Society (2005)
Published in Journal of the Electrochemical Society (2005)
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Published in ECS transactions (07.07.2006)
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Year of Publication 27.06.2013
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TRANSIENT ENHANCED ATOMIC LAYER DEPOSITION
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Transient enhanced atomic layer deposition
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Year of Publication 19.07.2011
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Transient enhanced atomic layer deposition
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Characterization of Charge Modification in ALD Nanolaminates
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Published in Meeting abstracts (Electrochemical Society) (17.02.2006)
Published in Meeting abstracts (Electrochemical Society) (17.02.2006)
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Semiconductor component has trenches arranged within first capacitor region of capacitors, are perpendicular to trenches arranged within second capacitor region of capacitors
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Transient enhanced atomic layer deposition
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Year of Publication 05.06.2008
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