Search Results - "Spengler, Uwe" :: K.UTB vyhledávací portál

Stability of ZnSe-Passivated Laser Facets Cleaved in Air and in Ultra-High Vacuum

by Boschker, Jos E., Spengler, Uwe, Ressel, Peter, Schmidbauer, Martin, Mogilatenko, Anna, Knigge, Andrea
Published in IEEE photonics journal (01.06.2022)

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Journal Article

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Stability of ZnSe-passivated laser facets cleaved in air and in ultra-high vacuum

by Boschker, Jos E., Spengler, Uwe, Ressel, Peter, Mogilatenko, Anna, Knigge, Andrea
Published in 2021 27th International Semiconductor Laser Conference (ISLC) (10.10.2021)

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Conference Proceeding

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Illumination system for a microlithographic projection exposure apparatus

by SIEKMANN HEIKO, SCHOLZ AXEL, MAUL MANFRED, DEGUENTHER MARKUS, SCHARNWEBER RALF, WANGLER JOHANNES, LAYH MICHAEL, VOLKEL REINHARD, SPENGLER UWE, WEIBLE KENNETH
Year of Publication 04.12.2008

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Patent

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Optical element in a microlithography optical system and method for changing optical properties of optical element

by UWE SPENGLER, AXEL SCHOLZ
Year of Publication 04.06.2008

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Patent

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Illumination system for a microlithographic projection exposure apparatus

by Siekmann Heiko, Scharnweber Ralf, Layh Michael, Wangler Johannes, Scholz Axel, Spengler Uwe, Deguenther Markus, Maul Manfred, Voelkel Reinhard, Weible Kenneth
Year of Publication 21.02.2017

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Patent

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ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

by SIEKMANN HEIKO, SCHOLZ AXEL, MAUL MANFRED, DEGUENTHER MARKUS, SCHARNWEBER RALF, WANGLER JOHANNES, LAYH MICHAEL, VOELKEL REINHARD, SPENGLER UWE, WEIBLE KENNETH
Year of Publication 17.03.2016

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Patent

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Illumination system for a microlithographic projection exposure apparatus

by SIEKMANN HEIKO, SCHOLZ AXEL, MAUL MANFRED, DEGUENTHER MARKUS, SCHARNWEBER RALF, WANGLER JOHANNES, LAYH MICHAEL, VOELKEL REINHARD, SPENGLER UWE, WEIBLE KENNETH
Year of Publication 22.12.2015

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Patent

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A FLOORBOARD

by SPENGLER, Dirk-Uwe
Year of Publication 07.06.2023

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Patent

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MOBILE FOUNDATION

by SPENGLER, Dirk-Uwe
Year of Publication 07.09.2022

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Patent

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Optical system useful in a device for laser material processing, comprises a housing, optical elements arranged inside the housing and having an optically active surface, a reception zone for receiving a flushing gas, and a flushing device

by HOLDERER, HUBERT, KIEREY, HOLGER, ANDERL, WILLI, SPENGLER, UWE
Year of Publication 25.11.2010

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Patent

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ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

by SIEKMANN HEIKO, SCHOLZ AXEL, MAUL MANFRED, DEGUENTHER MARKUS, SCHARNWEBER RALF, WANGLER JOHANNES, LAYH MICHAEL, VOELKEL REINHARD, SPENGLER UWE, WEIBLE KENNETH
Year of Publication 13.06.2013

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Patent

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ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

by LAYH, MICHAEL, VOELKEL, REINHARD, SIEKMANN, HEIKO, SCHARNWEBER, RALF, WANGLER, JOHANNES, WEIBLE, KENNETH, DEGUENTHER, MARKUS, SPENGLER, UWE, MAUL, MANFRED, SCHOLZ, AXEL
Year of Publication 08.05.2013

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Illumination system for a microlithographic projection exposure apparatus

by SIEKMANN HEIKO, SCHOLZ AXEL, MAUL MANFRED, DEGUENTHER MARKUS, SCHARNWEBER RALF, WANGLER JOHANNES, LAYH MICHAEL, VOELKEL REINHARD, SPENGLER UWE, WEIBLE KENNETH
Year of Publication 12.03.2013

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ILLUMINATION SYSTEM FOR MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

by SCHOLZ AXEL, UWE SPENGLER, RALF SCHARNWEBER, WEEVIL KENNETH, MARKUS DEGUNTHER, VANCLAR JOSEPHUS, REINHARD VOELKEL, SIECKMANN HEICO, MICHAEL LAI, MANFRED MAUL
Year of Publication 09.02.2012

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Illumination system for a microlithographic projection exposure apparatus

by LAYH, MICHAEL, VOELKEL, REINHARD, SIEKMANN, HEIKO, SCHARNWEBER, RALF, WANGLER, JOHANNES, WEIBLE, KENNETH, DEGUENTHER, MARKUS, SPENGLER, UWE, MAUL, MANFRED, SCHOLZ, AXEL
Year of Publication 11.08.2016

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ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

by SIEKMANN HEIKO, SCHOLZ AXEL, MAUL MANFRED, DEGUENTHER MARKUS, SCHARNWEBER RALF, WANGLER JOHANNES, LAYH MICHAEL, VOELKEL REINHARD, SPENGLER UWE, WEIBLE KENNETH
Year of Publication 22.01.2009

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Patent

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ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

by LAYH, MICHAEL, VOELKEL, REINHARD, SIEKMANN, HEIKO, SCHARNWEBER, RALF, WANGLER, JOHANNES, WEIBLE, KENNETH, DEGUENTHER, MARKUS, SPENGLER, UWE, MAUL, MANFRED, SCHOLZ, AXEL
Year of Publication 29.10.2008

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Illumination system for a microlithographic projection exposure apparatus

by LAYH, MICHAEL, VOELKEL, REINHARD, SIEKMANN, HEIKO, SCHARNWEBER, RALF, WANGLER, JOHANNES, WEIBLE, KENNETH, DEGUENTHER, MARKUS, SPENGLER, UWE, MAUL, MANFRED, SCHOLZ, AXEL
Year of Publication 11.10.2014

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ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

by LAYH, MICHAEL, VOELKEL, REINHARD, SIEKMANN, HEIKO, SCHARNWEBER, RALF, WANGLER, JOHANNES, WEIBLE, KENNETH, DEGUENTHER, MARKUS, SPENGLER, UWE, MAUL, MANFRED, SCHOLZ, AXEL
Year of Publication 23.08.2007

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Illumination system for a microlithographic projection exposure apparatus

by LAYH, MICHAEL, VOELKEL, REINHARD, SIEKMANN, HEIKO, SCHARNWEBER, RALF, WANGLER, JOHANNES, WEIBLE, KENNETH, DEGUENTHER, MARKUS, SPENGLER, UWE, MAUL, MANFRED, SCHOLZ, AXEL
Year of Publication 01.06.2014

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Patent

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