Search Results - "Soave, Robert" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

Process-Induced ReRAM Performance Improvement of Atomic Layer Deposited HfO 2 for Analog In-Memory Computing Applications

Process-Induced ReRAM Performance Improvement of Atomic Layer Deposited HfO 2 for Analog In-Memory Computing Applications

by Consiglio, Steven, Higuchi, Hisashi, Ando, Takashi, Jamison, Paul, Seo, Soon-Cheon, Kong, Dexin, Kim, Youngseok, Tapily, Kandabara, Clark, Robert D, Hopstaken, Marinus, Cartier, Eduard, Tsunomura, Takaaki, Wajda, Cory S, Soave, Robert, Narayanan, Vijay, Leusink, Gert J
Published in ECS transactions (07.05.2021)

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Journal Article

Process-Induced ReRAM Performance Improvement of Atomic Layer Deposited HfO2 for Analog In-Memory Computing Applications

Process-Induced ReRAM Performance Improvement of Atomic Layer Deposited HfO2 for Analog In-Memory Computing Applications

by Consiglio, Steven, Higuchi, Hisashi, Ando, Takashi, Jamison, Paul, Seo, Soon-Cheon, Kong, Dexin, Kim, Youngseok, Tapily, Kandabara, Clark, Robert D, Hopstaken, Marinus, Cartier, Eduard, Tsunomura, Takaaki, Wajda, Cory S, Soave, Robert, Narayanan, Vijay, Leusink, Gert J
Published in ECS transactions (07.05.2021)

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Journal Article

Process-Induced ReRAM Performance Improvement of Atomic Layer Deposited HfO 2 for Analog In-Memory Computing Applications

Process-Induced ReRAM Performance Improvement of Atomic Layer Deposited HfO 2 for Analog In-Memory Computing Applications

by Consiglio, Steven, Higuchi, Hisashi, Ando, Takashi, Jamison, Paul, Seo, Soon-Cheon, Kong, Dexin, Kim, Youngseok, Tapily, Kandabara, Clark, Robert D, Hopstaken, Marinus, Cartier, Eduard, Tsunomura, Takaaki, Wajda, Cory S, Soave, Robert, Narayanan, Vijay, Leusink, Gert J
Published in Meeting abstracts (Electrochemical Society) (30.05.2021)

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Journal Article

Process-Induced ReRAM Performance Improvement of Atomic Layer Deposited HfO2 for Analog In-Memory Computing Applications

Process-Induced ReRAM Performance Improvement of Atomic Layer Deposited HfO2 for Analog In-Memory Computing Applications

by Consiglio, Steven, Higuchi, Hisashi, Ando, Takashi, Jamison, Paul, Seo, Soon-Cheon, Kong, Dexin, Kim, Youngseok, Tapily, Kandabara, Clark, Robert D, Hopstaken, Marinus, Cartier, Eduard, Tsunomura, Takaaki, Wajda, Cory S, Soave, Robert, Narayanan, Vijay, Leusink, Gert J
Published in Meeting abstracts (Electrochemical Society) (30.05.2021)

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Journal Article

High aspect ratio microtunnel technique to empirically model electroless deposition

High aspect ratio microtunnel technique to empirically model electroless deposition

by DESILVA, M, SHACHAM-DIAMAND, Y, SOAVE, R, KIM, H
Published in Journal of the Electrochemical Society (01.04.1996)

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Journal Article

System and method of removing chamber residues from a plasma processing system in a dry cleaning process

System and method of removing chamber residues from a plasma processing system in a dry cleaning process

by SOAVE ROBERT J, MOSDEN AELAN, GAUDET MARCEL
Year of Publication 14.06.2011

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Patent

System and method of removing chamber residues from a plasma processing system in a dry cleaning process

System and method of removing chamber residues from a plasma processing system in a dry cleaning process

by Gaudet, Marcel, Mosden, Aelan, Soave, Robert J
Year of Publication 14.06.2011

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Patent

SYSTEM AND METHOD OF REMOVING CHAMBER RESIDUES FROM A PLASMA PROCESSING SYSTEM IN A DRY CLEANING PROCESS

SYSTEM AND METHOD OF REMOVING CHAMBER RESIDUES FROM A PLASMA PROCESSING SYSTEM IN A DRY CLEANING PROCESS

by SOAVE, ROBERT, J, GAUDET, MARCEL, MOSDEN, AELAN
Year of Publication 12.10.2006

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Patent

SYSTEM AND METHOD OF REMOVING CHAMBER RESIDUES FROM A PLASMA PROCESSING SYSTEM IN A DRY CLEANING PROCESS

SYSTEM AND METHOD OF REMOVING CHAMBER RESIDUES FROM A PLASMA PROCESSING SYSTEM IN A DRY CLEANING PROCESS

by SOAVE, ROBERT, J, GAUDET, MARCEL, MOSDEN, AELAN
Year of Publication 03.11.2005

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Patent

System and method of removing chamber residues from a plasma processing system in a dry cleaning process

System and method of removing chamber residues from a plasma processing system in a dry cleaning process

by SOAVE ROBERT J, MOSDEN AELAN, GAUDET MARCEL
Year of Publication 13.10.2005

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Patent

Method for using ion implantation to treat the sidewalls of a feature in a low-k dielectric film

Method for using ion implantation to treat the sidewalls of a feature in a low-k dielectric film

by Duerksen, Kenneth, Wang, David C, Soave, Robert J
Year of Publication 27.02.2007

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Patent

Method for using ion implantation to treat the sidewalls of a feature in a low-k dielectric film

Method for using ion implantation to treat the sidewalls of a feature in a low-k dielectric film

by SOAVE ROBERT J, WANG DAVID C, DUERKSEN KENNETH
Year of Publication 27.02.2007

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Patent

Method for using ion implantation to treat the sidewalls of a feature in a low-k dielectric film

Method for using ion implantation to treat the sidewalls of a feature in a low-k dielectric film

by SOAVE ROBERT J, WANG DAVID C, DUERKSEN KENNETH
Year of Publication 28.04.2005

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Patent

Method for using ion implantation to treat the sidewalls of a feature in a low-k dielectric film

Method for using ion implantation to treat the sidewalls of a feature in a low-k dielectric film

by SOAVE, ROBERT, WANG, DAVID, DUERKSEN, KENNETH
Year of Publication 01.11.2008

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Patent

System and method of removing chamber residues from a plasma processing system in a dry cleaning process

System and method of removing chamber residues from a plasma processing system in a dry cleaning process

by SOAVE, ROBERT, GAUDET, MARCEL, MOSDEN, AELAN
Year of Publication 01.01.2008

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Patent

System and method of removing chamber residues from a plasma processing system in a dry cleaning process

System and method of removing chamber residues from a plasma processing system in a dry cleaning process

by SOAVE, ROBERT, GAUDET, MARCEL, MOSDEN, AELAN
Year of Publication 01.01.2006

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Patent

Method for using ion implantation to treat the sidewalls of a feature in a low-k dielectric film

Method for using ion implantation to treat the sidewalls of a feature in a low-k dielectric film

by SOAVE, ROBERT, WANG, DAVID, DUERKSEN, KENNETH
Year of Publication 16.06.2005

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Patent

FABRICATION OF A MICROCHANNEL PLATE FROM A PERFORATED SILICON WORKPIECE

FABRICATION OF A MICROCHANNEL PLATE FROM A PERFORATED SILICON WORKPIECE

by THEN, ALAN M, TASKER, G. WILLIAM, SOAVE, ROBERT J, SHANK, STEVEN M
Year of Publication 12.02.2002

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Patent

Selective metallization for high temperature semiconductors

Selective metallization for high temperature semiconductors

by LILLIENFELD; DAVID, SOAVE; ROBERT, COMEAU; GERALD, SMITH; PAUL, THOMAS; DAVID
Year of Publication 11.02.1992

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Patent

FABRICATION OF A MICROCHANNEL PLATE FROM A PERFORATED SILICON WORKPIECE

FABRICATION OF A MICROCHANNEL PLATE FROM A PERFORATED SILICON WORKPIECE

by THEN, ALAN M, SOAVE, ROBERT J, TASKER, G. WILLIAM, SHANK, STEVEN M
Year of Publication 13.02.1997

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Patent