Perfectly Conformal TiN and Al2O3 Films Deposited by Atomic Layer Deposition
Ritala, Mikko, Leskelä, Markku, Dekker, Jan-Pieter, Mutsaers, Cees, Soininen, Pekka J., Skarp, Jarmo
Published in Chemical vapor deposition (01.01.1999)
Published in Chemical vapor deposition (01.01.1999)
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Journal Article
Atomic layer epitaxy growth of doped zinc oxide thin films from organometals
Lujala, Vesa, Skarp, Jarmo, Tammenmaa, Markku, Suntola, Tuomo
Published in Applied surface science (01.12.1994)
Published in Applied surface science (01.12.1994)
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Journal Article
Conference Proceeding
Excellent passivation and low reflectivity Al2O3 /TiO2 bilayer coatings for n-wafer silicon solar cells
Lee, B. G., Skarp, J., Malinen, V., Shuo Li, Sukgeun Choi, Branz, H. M.
Published in 2012 38th IEEE Photovoltaic Specialists Conference (01.06.2012)
Published in 2012 38th IEEE Photovoltaic Specialists Conference (01.06.2012)
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Conference Proceeding
Properties of Al2O3-films deposited on silicon by atomic layer epitaxy
Ericsson, Per, Bengtsson, Stefan, Skarp, Jarmo
Published in Microelectronic engineering (01.06.1997)
Published in Microelectronic engineering (01.06.1997)
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Journal Article
ALE-reactor for large area depositions
Skarp, Jarmo I, Soininen, Pekka J, Soininen, Pekka T
Published in Applied surface science (01.03.1997)
Published in Applied surface science (01.03.1997)
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Journal Article
Conference Proceeding
Silicon Surface Passivation by Al2O3: Effect of ALD Reactants
Repo, Päivikki, Talvitie, Heli, Li, Shuo, Skarp, Jarmo, Savin, Hele
Published in Energy procedia (2011)
Published in Energy procedia (2011)
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Journal Article
Excellent passivation and low reflectivity with atomic layer deposited bilayer coatings for n-type silicon solar cells
Lee, Benjamin G., Li, Shuo, von Gastrow, Guillaume, Yli-Koski, Marko, Savin, Hele, Malinen, Ville, Skarp, Jarmo, Choi, Sukgeun, Branz, Howard M.
Published in Thin solid films (01.01.2014)
Published in Thin solid films (01.01.2014)
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Journal Article