Analysis of the tilt and rotation angle dependence of boron distributions implanted into silicon
KLEIN, K. M, CHANGHAE PARK, TASCH, A. F, SIMONTON, R. B, NOVAK, S
Published in Journal of the Electrochemical Society (01.07.1991)
Published in Journal of the Electrochemical Society (01.07.1991)
Get full text
Journal Article
An accurate and computationally efficient semi-empirical model for arsenic implants into single-crystal (100) silicon
SHYH-HORNG YANG, MORRIS, S. J, LIM, D. L, TASCH, A. F, SIMONTON, R. B, KAMENITSA, D, MAGEE, C, LUX, G
Published in Journal of electronic materials (01.08.1994)
Published in Journal of electronic materials (01.08.1994)
Get full text
Journal Article
A COMPREHENSIVE AND COMPUTATIONALLY EFFICIENT MODELING STRATEGY FOR SIMULATION OF BORON ION IMPLANTATION INTO SINGLECRYSTAL SILICON WITH EXPLICIT DOSE AND IMPLANT ANGLE DEPENDENCE
Park, Changhae, Klein, Kevin M., Tasch, Al F., Simonton, Robert B., Novak, Steve, Lux, Gayle
Published in Compel (01.04.1991)
Published in Compel (01.04.1991)
Get full text
Journal Article
A COMPREHENSIVE AND COMPUTATIONALLY EFFICIENT MODELING STRATEGY FOR SIMULATION OF BORON ION IMPLANTATION INTO SINGLE-CRYSTAL SILICON WITH EXPLICIT DOSE AND IMPLANT ANGLE DEPENDENCE
Park, Changhae, Klein, Kevin M., Tasch, Al F., Simonton, Robert B., Novak, Steve, Lux, Gayle
Published in Compel (01.04.1991)
Published in Compel (01.04.1991)
Get full text
Journal Article