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METHOD FOR PRODUCING EPITAXIALLY COATED SILICON WAFERS
Year of Publication 19.05.2008
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Patent
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Ideal oxygen precipitating silicon wafers with nitrogen/carbon stabilized oxygen precipitate nucleation centers and process for making the same
MULE'STAGNO LUCIANO, LIBBERT JEFFREY L, BANAN MOHSEN, KULKARNI MILIND, PHILLIPS RICHARD J, BRUNKHORST STEPHEN J
Year of Publication 24.07.2003
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Year of Publication 24.07.2003
Patent
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Hydrogen heat treatment method of silicon wafers using a high-purity inert substitution gas
SANADA; MASAYUKI, SHIMIZU; TATSUYA, YOSHIKAWA; JUN, MATSUSHITA; JUNICHI
Year of Publication 23.05.2000
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Year of Publication 23.05.2000
Patent
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An Asymptotic Model of Nonadiabatic Catalytic Flames in Stagnation-Point Flow
Margolis, Stephen B., Gardner, Timothy J.
Published in SIAM journal on applied mathematics (01.01.2003)
Published in SIAM journal on applied mathematics (01.01.2003)
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Natcore Technology Successfully Uses LPD Process on Textured Solar Cells: Advance Enables Cost Savings by Allowing Use of Thinner Silicon Wafers
Published in Marketwire
(05.05.2011)
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Dynex Power Announces the Arrangement of New Banking Facilities
Published in Canada NewsWire
(06.09.2006)
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