Photolabile Carboxylic Acid Protected Terpolymers for Surface Patterning. Part 2: Photocleavage and Film Patterning
Millaruelo, M, Eng, L. M, Mertig, M, Pilch, B, Oertel, U, Opitz, J, Sieczkowska, B, Simon, F, Voit, B
Published in Langmuir (24.10.2006)
Published in Langmuir (24.10.2006)
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Journal Article
Photolabile and thermally labile polymers as templates and for surface patterning
Voit, B., Braun, F., Gernert, M., Sieczkowska, B., Millaruelo, M., Messerschmidt, M., Mertig, M., Opitz, J.
Published in Polymers for advanced technologies (01.09.2006)
Published in Polymers for advanced technologies (01.09.2006)
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Journal Article