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A measurement of Λ and Ξ − polarization in inclusive production by Σ − of 340 GeV/c in C and Cu targets
by
Siebert
, Hans-
Wolfgang
Published in
Nuclear physics. A
(13.06.2005)
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A measurement of Λ and polarization in inclusive production by of 340 GeV/c in C and Cu targets
by
Siebert
, Hans-
Wolfgang
Published in
Nuclear physics. A
(01.06.2005)
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Neutron decay, semileptonic hyperon decays and the Cabibbo model
by
Siebert
, Hans-
Wolfgang
Published in
Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment
(20.11.1989)
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DIE BINDUNGSWIRKUNG DES ERBVERTRAGES: Ein Beitrag zur Gesetzesauslegung im Erbrecht, vor allem zu § 2289 BGB
by
Siebert
,
Wolfgang
Published in
Recht und Wirtschaft
(2015)
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Cable connecting device
by
Siebert
,
Wolfgang
Year of Publication
05.12.2002
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Patent
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Epitaxially coated semiconductor wafer and process for producing it
by
Siebert
,
Wolfgang
,
Storck, Peter
Year of Publication
07.02.2006
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Epitaxially coated semiconductor wafer and process for producing it
by
STORCK PETER
,
SIEBERT WOLFGANG
Year of Publication
07.02.2006
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A measurement of ∧ and Ξ− polarization in inclusive production by Σ− of 340 GeV/c in C and Cu targetsof 340 GeV/c in C and Cu targets
by
Siebert
, Hans-
Wolfgang
Published in
Czechoslovak journal of physics
(01.01.2005)
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A search for the exotic Ξ−− (1860) in the hyperon beam experiment WA89(1860) in the hyperon beam experiment WA89
by
Siebert
, Hans-
Wolfgang
Published in
Czechoslovak journal of physics
(01.01.2005)
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Epitaxially coated semiconductor wafer and process for producing it
by
STORCK PETER
,
SIEBERT WOLFGANG
Year of Publication
17.06.2004
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Epitaxially coated semiconductor wafer and process for producing it
by
Storck, Peter
,
Siebert
,
Wolfgang
Year of Publication
17.06.2004
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It only takes one vote to bring back Great Lakes Jam: Final Edition
by
Siebert
,
Wolfgang
Published in
Sun times (Owen Sound)
(31.03.2005)
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Cable connecting device
by
SIEBERT WOLFGANG
PETER
Year of Publication
05.12.2002
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SEMICONDUCTOR DISK, ITS MANUFACTURING METHOD AND ITS USE
by
STORCK PETER
,
SIEBERT WOLFGANG
Year of Publication
07.09.2001
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Semiconductor wafer has a rear side and a front side with an epitaxial layer having a specified maximum density of scattered light centers
by
SIEBERT
,
WOLFGANG
,
STORCK, PETER
Year of Publication
05.07.2001
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CABLE CONNECTING DEVICE
by
SIEBERT
,
WOLFGANG
, PETER
Year of Publication
07.06.2001
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Verfahren zur Herstellung einer epitaxierten Halbleiterscheibe und deren Verwendung
by
SIEBERT
,
WOLFGANG
,
STORCK, PETER
Year of Publication
12.04.2007
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Process for calibrating the temperature measuring system of a high temperature reactor comprises preparing a calibrating plate with a doping material, determining the thickness of the layer, thermally treating, and further processing
by
SIEBERT
,
WOLFGANG
,
ZIEGLER, JOERG
,
STORCK, PETER
Year of Publication
30.10.2003
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Process for the production of an epitaxially coated semiconductor wafer
by
SIEBERT
;
WOLFGANG
,
MAYER; ERWIN-PETER
Year of Publication
27.04.1999
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Method and apparatus for epitaxially coating semiconductor wafer, and coated semiconductor wafer
by
VON AMMON WILFRIED,SCHMOLKE RUEDIGER,STORCK PETER,
SIEBERT WOLFGANG
Year of Publication
24.01.2007
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