New Photoresist Materials for 157-nm Lithography. Poly[Vinylsulfonyl Fluoride-c o-4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)-styrene] Partially Protected with tert-Butoxycarbonyl
Fujigaya, Tsuyohiko, Sibasaki, Yuji, Ando, Shinji, Kishimura, Shinji, Endo, Masayoshi, Sasago, Masaru, Ueda, Mitsuru
Published in Chemistry of materials (08.04.2003)
Published in Chemistry of materials (08.04.2003)
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