New vaporization sources for H2O2 for pre-treatment/cleaning of ALD deposition surfaces
Alvarez, Dan, Heinlein, Ed, Holmes, Russell J., Arya, Bhuvnesh, Shon-Roy, Lita, Spiegelman, Jeff
Published in ASMC 2013 SEMI Advanced Semiconductor Manufacturing Conference (01.05.2013)
Published in ASMC 2013 SEMI Advanced Semiconductor Manufacturing Conference (01.05.2013)
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Conference Proceeding
The era of IoT advancing CMP consumables growth
Davis, Sue, Holland, Karey, Yang, Jerry, Fury, Michael A., Shon-Roy, Lita
Published in 2015 International Conference on Planarization/CMP Technology (ICPT) (01.09.2015)
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Published in 2015 International Conference on Planarization/CMP Technology (ICPT) (01.09.2015)
Conference Proceeding
Material Costs Determine c-Si vs. a-Si Solar Race
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Magazine Article
Trade Publication Article
When Good Gas Goes Bad: Gas Purifiers at Work
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Magazine Article
Trade Publication Article