Recent Progress in EUV Resist Outgas Research at EIDEC
Shiobara, Eishi, Takagi, Isamu, Kikuchi, Yukiko, Sasami, Takeshi, Minegishi, Shinya, Fujimori, Toru, Watanabe, Takeo, Harada, Tetsuo, Kinoshita, Hiroo, Inoue, Soichi
Published in Journal of Photopolymer Science and Technology (01.01.2015)
Published in Journal of Photopolymer Science and Technology (01.01.2015)
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Journal Article
Development of Tool for Contamination Layer Thickness Measurement Using High Power Extreme Ultraviolet Light and in Situ Ellipsometer
Watanabe, Takeo, Kikuchi, Yukiko, Takahashi, Toshiya, Katayama, Kazuhiro, Takagi, Isamu, Sugie, Norihiko, Tanaka, Hiroyuki, Shiobara, Eishi, Inoue, Soichi, Harada, Tetsuo, Kinoshita, Hiroo
Published in Japanese Journal of Applied Physics (01.05.2013)
Published in Japanese Journal of Applied Physics (01.05.2013)
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Journal Article
Comparison of Resist Family Outgassing Characterization between EUV and EB
Takagi, Isamu, Takahashi, Toshiya, Sugie, Norihiko, Katayama, Kazuhiro, Kikuchi, Yukiko, Shiobara, Eishi, Tanaka, Hiroyuki, Inoue, Soichi, Watanabe, Takeo, Harada, Tetsuo, Kinoshita, Hiroo
Published in Journal of Photopolymer Science and Technology (01.01.2013)
Published in Journal of Photopolymer Science and Technology (01.01.2013)
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Journal Article
Comparison of Resist Outgassing Characterization between High Power EUV and EB
Sugie, Norihiko, Takahashi, Toshiya, Katayama, Kazuhiro, Takagi, Isamu, Kikuchi, Yukiko, Shiobara, Eishi, Tanaka, Hiroyuki, Inoue, Soichi, Watanabe, Takeo, Harada, Tetsuo, Kinoshita, Hiroo
Published in Journal of Photopolymer Science and Technology (01.01.2012)
Published in Journal of Photopolymer Science and Technology (01.01.2012)
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Journal Article
Characterization of Microbridges Generated on Negative Resist Patterns
Keisuke Nakazawa, Keisuke Nakazawa, Eishi Shiobara, Eishi Shiobara, Masafumi Asano, Masafumi Asano, Yasuhiko Sato, Yasuhiko Sato, Satoshi Tanaka, Satoshi Tanaka, Yasunobu Oonishi, Yasunobu Oonishi
Published in Japanese Journal of Applied Physics (01.03.1999)
Published in Japanese Journal of Applied Physics (01.03.1999)
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Journal Article
A New Stacked-Mask Process Utilizing Spun-on Carbon Film for Sub-130-nm Etching
Abe, Junko, Hayashi, Hisataka, Kishigami, Daizo, Sato, Yasuhiko, Shiobara, Eishi, Shibata, Tsuyoshi, Onishi, Yasunobu, Ohiwa, Tokuhisa
Published in Japanese Journal of Applied Physics (01.10.2003)
Published in Japanese Journal of Applied Physics (01.10.2003)
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Journal Article
Material and Process Development for KrF Lithography using Tri-level Resist Process
Sho, Koutaro, Shiobara, Eishi, Shibata, Tsuyoshi, Nakagawa, Seiji, Kajiwara, Seiji, Matsushita, Takaya, Urayama, Kazuhiko
Published in Journal of Photopolymer Science and Technology (2001)
Published in Journal of Photopolymer Science and Technology (2001)
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Journal Article
Pattern Transfer Process Using Spun-on Carbon Film for KrF and ArF Lithography
Sato, Yasuhiko, Shiobara, Eishi, Matsunaga, Kentaro, Shibata, Tsuyoshi, Abe, Junko, Hayashi, Hisataka, Ohiwa, Tokuhisa, Kasai, Mayumi, Hachiya, Takayo, Onishi, Yasunobu
Published in Journal of Photopolymer Science and Technology (2001)
Published in Journal of Photopolymer Science and Technology (2001)
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Journal Article
Effect of Re-sticking Acid on Resist Profile
Shiobara, Eishi, Kawamura, Daisuke, Matsunaga, Kentaro, Onishi, Yasunobu
Published in Journal of Photopolymer Science and Technology (2001)
Published in Journal of Photopolymer Science and Technology (2001)
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Journal Article
Real Time Measurement of Exact Size and Refractive Index of Particles in Liquid by Flow Particle Tracking Method
Tabuchi, Takuya, Bando, Kazuna, Kondo, Sota, Tomita, Hiroshi, Shiobara, Eishi, Hayashi, Hidekazu, Kato, Haruhisa, Matsuura, Yusuke, Nakamura, Ayako, Kondo, Kaoru
Published in 2018 International Symposium on Semiconductor Manufacturing (ISSM) (01.12.2018)
Published in 2018 International Symposium on Semiconductor Manufacturing (ISSM) (01.12.2018)
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