Real-Time Measurement of Exact Size and Refractive Index of Particles in Liquid by Flow Particle Tracking Method
Tabuchi, T., Kondo, K., Bando, K., Kondo, S., Tomita, H., Shiobara, E., Hayashi, H., Kato, H., Nakamura, A., Matsuura, Y.
Published in IEEE transactions on semiconductor manufacturing (01.11.2019)
Published in IEEE transactions on semiconductor manufacturing (01.11.2019)
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Journal Article
Application of Polysilanes to LSI Manufacturing ProcessesTheir Antireflective Properties and Etching Selectivity toward Resists
Hayase, S, Nakano, Y, Ohta, H, Sato, Y, Shiobara, E, Miyoshi, S, Onishi, Y, Abe, M, Matsuyama, H, Ohiwa, Y
Published in Chemistry of materials (18.06.2001)
Published in Chemistry of materials (18.06.2001)
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Journal Article
Application of organic silicon cluster to patter transfer process for deep UV lithography
Sato, Y., Shiobara, E., Abe, J., Onishi, Y., Nakano, Y., Hayase, S.
Published in Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) (2000)
Published in Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) (2000)
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Conference Proceeding
Statistical observation of prosthesis (2)
Tagawa, S, Kumazawa, H, Kurita, E, Sasajima, H, Shiobara, E, Takemura, S, Nakamura, M, Niidome, T, Yoshida, M, Matsuura, H
Published in Tsurumi shigaku (01.09.1985)
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Published in Tsurumi shigaku (01.09.1985)
Journal Article
Application of Polysilanes to LSI Manufacturing ProcessesTheir Antireflective Properties and Etching Selectivity toward Resists
Hayase, S., Nakano, Y., S.Yoshikawa, and, Ohta, H., Sato, Y., Shiobara, E., Miyoshi, S., Onishi, Y., Abe, M., Matsuyama, H., Ohiwa, Y.
Published in Chemistry of materials (01.06.2001)
Published in Chemistry of materials (01.06.2001)
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Journal Article
A New Stacked-Mask Process Utilizing Spun-on Carbon Film for Sub-130-nm Etching
Abe, Junko, Hayashi, Hisataka, Kishigami, Daizo, Sato, Yasuhiko, Shiobara, Eishi, Shibata, Tsuyoshi, Onishi, Yasunobu, Ohiwa, Tokuhisa
Published in Japanese Journal of Applied Physics (01.10.2003)
Published in Japanese Journal of Applied Physics (01.10.2003)
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Journal Article
Characterization of Microbridges Generated on Negative Resist Patterns
Keisuke Nakazawa, Keisuke Nakazawa, Eishi Shiobara, Eishi Shiobara, Masafumi Asano, Masafumi Asano, Yasuhiko Sato, Yasuhiko Sato, Satoshi Tanaka, Satoshi Tanaka, Yasunobu Oonishi, Yasunobu Oonishi
Published in Japanese Journal of Applied Physics (01.03.1999)
Published in Japanese Journal of Applied Physics (01.03.1999)
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Journal Article
Patterning strategy for random contact holes in ultra-low k1 lithography condition
Mimotogi, S., Nakamura, H., Shiobara, E., Miyazaki, M., Inoue, S.
Published in Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference (2003)
Published in Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference (2003)
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Conference Proceeding
ArF lithography technologies for 65 nm-node CMOS (CMOS5) with 30 nm logic gate and high density embedded memories
Hashimoto, K., Uesawa, F., Takahata, K., Kikuchi, K., Kanai, H., Shimizu, H., Shiobara, E., Takeuchi, K., Endo, A., Harakawa, H., Mimotogi, S.
Published in 2003 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.03CH37407) (2003)
Published in 2003 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.03CH37407) (2003)
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Conference Proceeding
Oxygen adsorption on a NbC0.9(111) surface: Angle-resolved photoemission study
Edamoto, K, Anazawa, T, Shiobara, E, Hatta, M, Miyazaki, E, Kato, H, Otani, S
Published in Physical review. B, Condensed matter (15.02.1991)
Published in Physical review. B, Condensed matter (15.02.1991)
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