Gas phase particle formation and elimination on Si (100) in low temperature reduced pressure chemical vapor deposition silicon-based epitaxial layers
Shinriki, Manabu, Chung, Keith, Hasaka, Satoshi, Brabant, Paul, He, Hong, Adam, Thomas N., Sadana, Devendra
Published in Thin solid films (01.02.2012)
Published in Thin solid films (01.02.2012)
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Conference Proceeding
High strain embedded-SiGe via low temperature reduced pressure chemical vapor deposition
He, Hong, Brabant, Paul, Chung, Keith, Shinriki, Manabu, Adam, Thomas, Reznicek, Alexander, Sadana, Devendra, Hasaka, Satoshi, Francis, Terry
Published in Thin solid films (01.02.2012)
Published in Thin solid films (01.02.2012)
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Journal Article
Conference Proceeding
Moisture requirements to reduce interfacial sub-oxides and lower hydrogen pre-bake temperatures for RPCVD Si epitaxy
Brabant, Paul D., Shinriki, Manabu, Vininski, Joe, Raynor, Mark W., Torres, Robert, Francis, Terry A.
Published in Journal of crystal growth (15.10.2013)
Published in Journal of crystal growth (15.10.2013)
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Journal Article
Gas Source Depletion Study of High-Order Silanes of Silicon-Based Epitaxial Layers Grown with RPCVD and Low Temperatures
Chung, Keith H., Brabant, Paul, Shinriki, Manabu, Hasaka, Satoshi, Francis, Terry, He, Hong, Sadana, Devendra K.
Published in ECS transactions (27.04.2012)
Published in ECS transactions (27.04.2012)
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Carbon-Doped Silicon Oxide Films with Hydrocarbon Network Bonds for Low-k Dielectrics: Theoretical Investigations
Tajima, Nobuo, Ohno, Takahisa, Hamada, Tomoyuki, Yoneda, Katsumi, Kondo, Seiichi, Kobayashi, Nobuyoshi, Shinriki, Manabu, Inaishi, Yoshiaki, Miyazawa, Kazuhiro, Sakota, Kaoru, Hasaka, Satoshi, Inoue, Minoru
Published in Japanese Journal of Applied Physics (01.09.2007)
Published in Japanese Journal of Applied Physics (01.09.2007)
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Journal Article
PLASMA FILM-FORMING METHOD AND APPARATUS THEREFOR
ISAKI, RYUICHIRO, NISHIZAWA, KENICHI, KAMESHIMA, TAKATOSHI, KOBAYASHI, YASUO, SHINRIKI, MANABU
Year of Publication 02.03.2006
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Year of Publication 02.03.2006
Patent
Thermal budget reduction and throughput enhancement for CMOS Epi stressors via wet clean interface contamination evaluation and control
Brabant, P., Chung, K., Shinriki, M., Hasaka, S., Scott, D., Wirzbicki, M., Francis, T., Hong He, Sadana, D. K.
Published in 2011 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (01.05.2011)
Published in 2011 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (01.05.2011)
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Conference Proceeding
METHOD FOR FORMING INSULATING FILM AND INSULATING FILM
TAJIMA, NOBUO, HASAKA, SATOSHI, OHNO, TAKAHISA, INOUE, MINORU, HAMADA, TOMOYUKI, SHINRIKI, MANABU, MIYAZAWA, KAZUHIRO, KOBAYASHI, NOBUYOSHI, SAKODA, KAORU
Year of Publication 08.02.2007
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Year of Publication 08.02.2007
Patent
Effect of Mechanical Mixture of Alumina and Silver Supported Catalysts on the Activity for the Selective Reduction of NO
SHINRIKI, Manabu, HANEDA, Masaaki, KINTAICHI, Yoshiaki, NAGAO, Yukinori, SATO, Kazuhito, YOSHINARI, Tomohiro, HAMADA, Hideaki
Published in Journal of the Japan Petroleum Institute (01.11.2002)
Published in Journal of the Japan Petroleum Institute (01.11.2002)
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Journal Article
LOW TEMPERATURE SELECTIVE DEPOSITION EMPLOYING A GERMANIUM-CONTAINING GAS ASSISTED ETCH
Sadana Devendra K, Zhu Zhengmao, Shinriki Manabu, Brabant Paul D, Chung Keith, He Hong, Yin Yunpeng
Year of Publication 06.07.2017
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Year of Publication 06.07.2017
Patent
Gas Source Depletion Study of High-Order Silanes of Silicon-Based Epitaxial Layers Grown with RPCVD and Low Temperatures
Chung, Keith H., Brabant, Paul, Shinriki, Manabu, He, Hong, Sadana, Devendra K., Hasaka, Satoshi, Francis, Terry
Published in Meeting abstracts (Electrochemical Society) (12.04.2012)
Published in Meeting abstracts (Electrochemical Society) (12.04.2012)
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