Search Results - "Shinjo, Tetsuya" :: K.UTB vyhledávací portál

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Study of High Etch Rate Bottom Antireflective Coating and Gap Fill Materials Using Dextrin Derivatives in ArF Lithography

by Takei, Satoshi, Shinjo, Tetsuya, Sakaida, Yasushi
Published in Japanese Journal of Applied Physics (01.11.2007)

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Study of Self Cross-Link Bottom Antireflective Coating and Gap Fill Materials for Sublimate Defect Reduction in ArF Lithography

by Takei, Satoshi, Shinjo, Tetsuya, Sakaida, Yasushi
Published in Japanese Journal of Applied Physics (01.03.2007)

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Gap Fill Materials Using Cyclodextrin Derivatives in ArF Lithography

by Takei, Satoshi, Shinjo, Tetsuya, Sakaida, Yasushi, Hashimoto, Keisuke
Published in Japanese Journal of Applied Physics (01.11.2007)

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RELEASE AGENT COMPOSITION FOR PHOTOIRRADIATION RELEASE, LAYERED PRODUCT, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE

by SHINJO Tetsuya, YAGYU Masafumi
Year of Publication 26.09.2024

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박리성 부여제, 접착제 조성물, 적층체, 및 반도체 기판의 제조 방법

by SHINJO TETSUYA, FUKUDA TAKUYA
Year of Publication 30.07.2024

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PEELING AGENT COMPOSITION FOR PHOTOIRRADIATION-BASED PEELING, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE OR ELECTRONIC DEVICE LAYER

by YANAI Masaki, SHINJO Tetsuya
Year of Publication 20.06.2024

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REMOVER COMPOSITION FOR LIGHT IRRADIATION REMOVAL, MULTILAYER BODY, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE

by SHINJO Tetsuya, YAGYU Masafumi
Year of Publication 28.03.2024

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METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE, AND PEELING AND DISSOLVING COMPOSITION

by SHINJO Tetsuya, YAGYU Masafumi
Year of Publication 21.03.2024

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METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE, AND PEELING AND DISSOLVING COMPOSITION

by SHINJO Tetsuya, YAGYU Masafumi
Year of Publication 21.03.2024

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RELEASE AGENT COMPOSITION FOR PHOTOIRRADIATION RELEASE, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE

by FUKUDA Takuya, SHINJO Tetsuya
Year of Publication 07.03.2024

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Characterization of Gap Fill Materials for Planarizing Substrate in Via-First Dual Damascene Lithography Process

by Takei, Satoshi, Sakaida, Yasushi, Shinjo, Tetsuya
Published in Japanese Journal of Applied Physics (01.09.2007)

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REMOVER COMPOSITION FOR LIGHT IRRADIATION REMOVAL

by SHINJO Tetsuya, OKUNO Takahisa
Year of Publication 28.12.2023

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Patent

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Ultraviolet Cross-Link Gap Fill Materials and Planarization Applications for Patterning Metal Trenches in 32–45 nm Via First Dual Damascene Process

by Takei, Satoshi, Shinjo, Tetsuya, Horiguchi, Yusuke
Published in Japanese Journal of Applied Physics (01.07.2007)

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ADHESIVE COMPOSITION FOR LIGHT IRRADIATION PEELING, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE OR ELECTRONIC DEVICE LAYER

by SHINJO Tetsuya, OKUNO Takahisa
Year of Publication 21.12.2023

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ADHESIVE COMPOSITION FOR LIGHT-IRRADIATION PEELING, LAMINATE, METHOD FOR PRODUCING LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE

by SHINJO TETSUYA, FUKUDA TAKUYA
Year of Publication 07.09.2023

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RELEASABILITY IMPARTER, ADHESIVE COMPOSITION, LAYERED PRODUCT, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE

by FUKUDA Takuya, SHINJO Tetsuya
Year of Publication 08.06.2023

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적층체 및 박리제 조성물

by SHINJO TETSUYA, OGATA HIROTO
Year of Publication 25.10.2022

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MULTILAYER OBJECT AND RELEASE AGENT COMPOSITION

by OGATA, Hiroto, SHINJO, Tetsuya
Year of Publication 26.08.2021

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ADHESIVE COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE

by FUKUDA Takuya, SHINJO Tetsuya, YAGYU Masafumi
Year of Publication 12.09.2024

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METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE, AND COMPOSITION FOR PEELING AND DISSOLVING

by SHINJO Tetsuya, OKUNO Takahisa, YAGYU Masafumi
Year of Publication 29.08.2024

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Patent

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