Lightly doped drain structure for advanced CMOS (Twin-Tub IV)
Kuo-hua Lee, Jones, B.R., Burke, C., Tran, L.V., Shimer, J.A., Chen, M.L.
Published in 1985 International Electron Devices Meeting (1985)
Published in 1985 International Electron Devices Meeting (1985)
Get full text
Conference Proceeding
Integrable high voltage CMOS: Devices, process application
Meyer, W.G., Dick, G.W., Olson, K.H., Lee, K.H., Shimer, J.A.
Published in 1985 International Electron Devices Meeting (1985)
Published in 1985 International Electron Devices Meeting (1985)
Get full text
Conference Proceeding
Scaling studies of CMOS SRAM soft-error tolerances - From 16K to 256K
Fu, J.S., Lee, K.H., Koga, R., Hewlett, F.W., Flores, R., Anderson, R.E., Desko, J.C., Nagy, W.J., Shimer, J.A., Kohler, R.A., Steenwyk, S.D.
Published in 1987 International Electron Devices Meeting (1987)
Published in 1987 International Electron Devices Meeting (1987)
Get full text
Conference Proceeding