vfTLP characteristics of ESD diodes in bulk si gate-all-around vertically stacked horizontal nanowire technology
Shih-Hung Chen, Hellings, Geert, Scholz, Mirko, Linten, Dimitri, Mertens, Hans, Ritzenthaler, Romain, Boschke, Roman, Groeseneken, Guido, Mocuta, Anda, Horiguchi, Naoto
Published in 2017 39th Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD) (01.09.2017)
Published in 2017 39th Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD) (01.09.2017)
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