Maskless Lithographic Fine Patterning on Deeply Etched or Slanted Surfaces, and Grayscale Lithography, Using Newly Developed Digital Mirror Device Lithography Equipment
Iwasaki, Wataru, Takeshita, Toshihiro, Peng, Yao, Ogino, Hiroaki, Shibata, Hiromasa, Kudo, Yuji, Maeda, Ryutaro, Sawada, Renshi
Published in Japanese Journal of Applied Physics (01.06.2012)
Published in Japanese Journal of Applied Physics (01.06.2012)
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Journal Article
Maskless Lithographic Fine Patterning on Deeply Etched or Slanted Surfaces, and Grayscale Lithography, Using Newly Developed Digital Mirror Device Lithography Equipment
Iwasaki, Wataru, Takeshita, Toshihiro, Peng, Yao, Ogino, Hiroaki, Shibata, Hiromasa, Kudo, Yuji, Maeda, Ryutaro, Sawada, Renshi
Published in Japanese Journal of Applied Physics (01.06.2012)
Published in Japanese Journal of Applied Physics (01.06.2012)
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Journal Article
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